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首页> 外文期刊>Applied Surface Science >Effects of deposition temperature and thickness on the structural properties of thermal evaporated bismuth thin films
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Effects of deposition temperature and thickness on the structural properties of thermal evaporated bismuth thin films

机译：沉积温度和厚度对热蒸发铋薄膜结构性能的影响

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摘要

Bismuth (Bi) thin films of different thicknesses were deposited onto Si(1 0 0) substrate at various substrate temperatures by thermal evaporation technique. Influences of thickness and deposition temperature on the film morphologies, microstructure, and topographies were investigated. A columnar growth of hexahedron-like grains with bimodal particle size distribution was observed at high deposition temperature. The columnar growth and the presence of large grains induce the Bi films to have large surface roughness as evidenced by atomic force microscopy (AFM). The dependence of the crystalline orientation on the substrate temperature was analyzed by X-ray diffraction (XRD), which shows that the Bi films have completely randomly oriented polycrystalline structure with a rhombohedral phase at high deposition temperature (200℃) and were strongly textured with preferred orientation at low deposition temperatures (30 and 100℃).
机译：通过热蒸发技术，在不同的衬底温度下，将不同厚度的铋（Bi）薄膜沉积到Si（1 0 0）衬底上。研究了厚度和沉积温度对薄膜形态，微观结构和形貌的影响。在高沉积温度下观察到具有双峰粒度分布的六面体状晶粒的柱状生长。柱状生长和大晶粒的存在使Bi膜具有较大的表面粗糙度，如原子力显微镜（AFM）所证明的。通过X射线衍射（XRD）分析了晶体取向对衬底温度的依赖性，结果表明，在高沉积温度（200℃）下，Bi薄膜具有完全随机取向的带有菱形相的多晶结构，并具有较强的织构性。在低沉积温度（30和100℃）下的首选取向。

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