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Effects of anodizing conditions on bond strength of anodically oxidized film to titanium substrate

机译：阳极氧化条件对阳极氧化膜与钛基底结合强度的影响

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摘要

The bond strength of the oxide film to the titanium substrate and its inherent structural characteristics are very important preconditions for the success of titanium implants. The purpose of this study was to evaluate the micro-morphologies, crystalline structures, and bond strengths of the anodically oxidized films formed on titanium with the variation of electrolytes and applied current densities. In contrast to the specimens produced using sulfuric acid as the electrolyte, those produced using phosphoric acid showed quite different shapes and densities of the pores as the applied current densities were varied. The oxide films anodized in sulfuric acid consisted of anatase and rutile TiO_2, while TiP_2O_7 was predominantly formed on the Ti surfaces anodized using phosphoric acid as the electrolyte. The oxide films, which did not experience spark deposition showed amorphous shape and their bond strengths were significantly lower than those of the other groups (p < 0.05). Those specimens which experienced initial spark deposition with a low current condition showed the highest bond strengths (34.2 MPa) within each electrolyte sub-set. The growing rates of the oxide film thicknesses in relation to the electric current changes varied according to the type of electrolyte, and the oxide film thickness influenced the bond strength.
机译：氧化膜与钛基底的结合强度及其固有的结构特性是钛植入物成功的非常重要的前提。这项研究的目的是评估在钛表面形成的阳极氧化膜的微观形貌，晶体结构和结合强度，以及电解质和施加电流密度的变化。与使用硫酸作为电解质制备的样品相反，使用磷酸制备的样品随着施加的电流密度变化而显示出完全不同的孔形状和密度。在硫酸中阳极氧化的氧化膜由锐钛矿和金红石TiO_2组成，而TiP_2O_7主要形成在以磷酸为电解质进行阳极氧化的Ti表面。未经历火花沉积的氧化膜显示为非晶形，其结合强度显着低于其他组（p <0.05）。在低电流条件下经历初始火花沉积的那些样品在每个电解质子集中显示出最高的结合强度（34.2 MPa）。氧化物膜厚度相对于电流变化的增长率根据电解质的类型而变化，并且氧化物膜厚度影响结合强度。

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