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首页> 外文期刊>Applied Surface Science >Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature
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Residual stress and Curie temperature of Fe-N thin films prepared by dc magnetron sputtering at elevated temperature

机译：直流磁控溅射高温制备的Fe-N薄膜的残余应力和居里温度

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Fe-N thin films were prepared by dc magnetron sputtering at elevated temperature of 80 degrees C. The residual stress of the thin film was characterized by means of grazing incidence X-ray diffraction method. The effect of magnetron sputtering parameter on residual stress was investigated. The results indicate that the nitrogen content in working gas has great effects on the residual stress in the Fe-N thin film, and the residual stress increases firstly and then decreases with the increasing of nitrogen content in working gas. Curie temperature measurement shows that tensile residual stress enhances the ferromagnetic-paramagnetic transition temperature of Fe-N thin films under the condition of same phase composition. (c) 2005 Elsevier B.V. All rights reserved.
机译：通过在80℃的高温下通过直流磁控溅射制备Fe-N薄膜。通过掠入射X射线衍射法表征了薄膜的残余应力。研究了磁控溅射参数对残余应力的影响。结果表明，工作气体中的氮含量对Fe-N薄膜中的残余应力有很大的影响，随着工作气体中氮含量的增加，残余应力先增大然后减小。居里温度测量表明，在相同相组成的条件下，拉伸残余应力会提高Fe-N薄膜的铁磁-顺磁转变温度。 （c）2005 Elsevier B.V.保留所有权利。

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