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首页> 外文期刊>Applied Surface Science >End group effect on surface and interfacial segregation in PS-PMMA blend thin films
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End group effect on surface and interfacial segregation in PS-PMMA blend thin films

机译：端基对PS-PMMA共混薄膜表面和界面偏析的影响

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摘要

Thin films of polystyrene (PS)/poly (methyl methacrylate) (PMMA) blends with different end groups were investigated using TOF-SIMS and AFM. PS with -OH and -NH2 end groups were blended in toluene solvent with pure PMMA homopolymer, and PMMA having anhydride end group. The ToF-SIMS spectra of PS-OH/PMMA resembled that of pure PS-PMMA blends showing an increase of PMMA intensity after annealing. On the contrary, the PS-NH2 blended with PMMA showed an increase in PS intensity on the surface after annealing. The ToF-SIMS spectra were similar to that of a pure PS-PMMA di-block copolymer. These results indicate copolymer formation at the surface. The PS-NH2 with PMMA-anhydride blend spectra showed very slight changes in spectra before and after annealing and the AFM images revealed spinodal bicontinuous structures on the surface before and after annealing. The copolymer formation is found to occur in the as-cast film itself and not after thermal treatment. (c) 2006 Elsevier B.V. All rights reserved.
机译：使用TOF-SIMS和AFM研究了具有不同端基的聚苯乙烯（PS）/聚甲基丙烯酸甲酯（PMMA）共混物的薄膜。将具有-OH和-NH2端基的PS在甲苯溶剂中与纯PMMA均聚物和具有酸酐端基的PMMA混合。 PS-OH / PMMA的ToF-SIMS光谱类似于纯PS-PMMA混合物的ToF-SIMS光谱，显示退火后PMMA强度增加。相反，与PMMA共混的PS-NH 2显示退火后表面上的PS强度增加。 ToF-SIMS光谱类似于纯PS-PMMA二嵌段共聚物的光谱。这些结果表明在表面形成共聚物。具有PMMA-酸酐共混物谱的PS-NH2在退火前后的光谱变化很小，而AFM图像则显示退火前后在表面上的旋节线双连续结构。发现共聚物的形成发生在铸态膜本身中，而不发生在热处理之后。 （c）2006 Elsevier B.V.保留所有权利。

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