Sputter yields in diamond bombarded by ultra low energy ions

de la Mata BG; Dowsett MG; Twitchen D

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Sputter yields in diamond bombarded by ultra low energy ions

机译：超低能离子轰击钻石的溅射产率

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Artificial diamond is an ideal material for high power, high voltage electronic devices, and for engineering use in extreme environments. Diamond process development requires parallel development in characterization techniques such as ultra low energy SIMS (uleSIMS), especially in the ability to depth profile for impurities and dopants at high depth resolution.

机译：人造钻石是大功率，高压电子设备以及极端环境中工程应用的理想材料。金刚石工艺的开发要求在表征技术（例如超低能量SIMS（uleSIMS））中进行并行开发，尤其是在以高深度分辨率对杂质和掺杂剂进行深度分布的能力方面。

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来源
《Applied Surface Science》 |2006年第19期|p. 6444-6447|共4页
作者
de la Mata BG; Dowsett MG; Twitchen D;
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作者单位

Univ Warwick, Dept Phys, Adv SIMS Projects, Coventry CV4 7AL, W Midlands, England;

Element Six Ltd, Ascot SL5 8BP, Berks, England;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
sputter yields; diamond; uleSIMS; oxygen bombardment; caesium bombardment; argon bombardment; MASS-SPECTROMETRY; SILICON;

机译：溅射产率;金刚石;uleSIMS;氧轰击;铯轰击;氩气轰击;质谱法;硅;

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专利

1. Energy and angular dependence of the sputter yield and ionization yield of Ge bombarded by O_2~+ [J] . C. Huyghebaert, T. Conard, W. Vandervorst Applied Surface Science . 2004,第Jun期

机译：O_2〜+轰击的Ge的溅射产率和电离产率的能量和角度依赖性
2. Low energy sputter yields for diamond, carbon-carbon composite, and molybdenum subject to xenon ion bombardment [J] . J.J.Blandino, D.G.Goodwin Diamond and Related Materials . 2000,第12期

机译：经受氙离子轰击的金刚石，碳-碳复合材料和钼的低能量溅射产率
3. Sputtering yields and surface modification of poly(methyl methacrylate) (PMMA) by low-energy Ar~+/ CF~+ _3ion bombardment with vacuum ultraviolet (VUV) photon irradiation [J] . Yoshimura S., Tsukazaki Y., Kiuchi M., Journal of Physics, D. Applied Physics: A Europhysics Journal . 2012,第50期

机译：真空紫外（VUV）光子辐照低能Ar〜+ / CF〜+ _3离子轰击聚甲基丙烯酸甲酯（PMMA）的溅射产率和表面改性
4. Energy effects on the sputtering yield of Si bombarded with gas cluster ion beams [C] . K. Ichiki, S. Ninomiya, T. Seki, International Conference on Ion Implantation Technology . 2011

机译：用气体聚类离子束轰击Si的溅射产量的能量效应
5. Application of diamond films to electric propulsion: Low energy sputter yield measurement and MPD plasma assisted chemical vapor deposition. [D] . Blandino, John Joseph. 2001

机译：金刚石薄膜在电推进中的应用：低能量溅射产率测量和MPD等离子体辅助化学气相沉积。
6. Sputtering Yields for C60 and Au3 Bombardment of Water Ice as a Function of Incident Kinetic Energy [O] . Michael F. Russo Jr., Christopher Szakal, Joseph Kozole, -1

机译：水冰的C60和Au3轰击的溅射产率与入射动能的关系
7. Application of diamond films to electric propulsion : low energy sputter yield measurement and MPD plasma assisted chemical vapor deposition [O] . Blandino John Joseph 2001

机译：金刚石薄膜在电力推进中的应用：低能溅射产率测量和mpD等离子体辅助化学气相沉积
8. Low Energy Sputter Yields for Diamond, Carbon-Carbon Composite, and Molybdenum Subject to Xenon Ion Nombardment [R] . Blandino, J., Goodwin, D., Garner, C. 1999

机译：受氙离子轰击影响的金刚石，碳 - 碳复合材料和钼的低能量溅射产率

Sputter yields in diamond bombarded by ultra low energy ions

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