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Effect of process parameters on surface morphology and characterization of PE-ALD SnO2 thin films for gas sensing

机译:工艺参数对气敏PE-ALD SnO2薄膜表面形貌和表征的影响

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摘要

Tin dioxide (SnO2) thin films were deposited by plasma enhanced-atomic layer deposition (PE-ALD) on Si(1 0 0) substrate using dibutyl tin diacetate (DBTA) ((CH3CO2)(2)Sn[(CH2)(3)-CH3](2)) as precursor. The process parameters were optimized as a function of substrate temperature, source temperature and purging time. It is observed that the surface phenomenon of the thin films was changed with film thickness. Atomic force microscopy (AFM) images and X-ray diffraction (XRD) pattern were used to observe the texture and crystallanity of the films. The films deposited for 100, 200 and 400 cycles were characterized by XPS to determine the chemical bonding properties. XPS results reveal that the surface dominant oxygen species for 100, 200 and 400 cycles deposited films are O-2(-), O- and O2-, respectively. The 200 cycles film has exhibited highest concentration of oxygen (O-) species before and after annealing. Conductivity studies revel that this film has best adsorption strength to the oxygen ions forming on the surface. The sensor with 200 cycles SnO2 thin film has shown highest sensitivity to CO gas than other films. A correlation between the characteristics of Sn3d(5/2) and O1s XPS spectra before and after annealing and the electrical behavior of the SnO2 thin films is established. (c) 2006 Elsevier B.V. All rights reserved.
机译:使用二乙酸二丁锡(DBTA)((CH3CO2)(2)Sn [(CH2)(3 )-CH3](2))作为前体。根据基材温度,源温度和吹扫时间对工艺参数进行了优化。观察到薄膜的表面现象随膜厚度而变化。使用原子力显微镜(AFM)图像和X射线衍射(XRD)图案观察薄膜的织构和结晶度。通过XPS对沉积100、200和400个循环的薄膜进行表征,以确定其化学键合性能。 XPS结果表明,100、200和400个循环沉积膜的表面优势氧种类分别为O-2(-),O-和O2-。 200个循环的薄膜在退火前后均表现出最高的氧(O-)浓度。电导率研究表明,该膜对表面形成的氧离子具有最佳的吸附强度。具有200次循环SnO2薄膜的传感器显示出对CO气体的灵敏度高于其他薄膜。建立了退火前后Sn3d(5/2)和O1s XPS光谱的特征与SnO2薄膜的电学行为之间的相关性。 (c)2006 Elsevier B.V.保留所有权利。

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