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Surface properties of cubic boron nitride thin films

机译：立方氮化硼薄膜的表面性质

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Studying the surface properties of cubic boron nitride (c-BN) thin films is very important to making it clear that its formation mechanism and application. In this paper, c-BN thin films were deposited on Si substrates by radio frequency sputter. The influence of working gas pressure on the formation of c-BN thin film was studied. The surface of c-BN films was analyzed by X-ray photoelectron spectroscopy (XPS), and the results showed that the surface of c-BN thin films contained C and O elements besides B and N. Value of N/B of c-BN thin films that contained cubic phase of boron nitride was very close to 1. The calculation based on XPS showed that the thickness of hexagonal boron nitride (h-BN) on the surface of c-BN films is approximately 0.8 nm. (c) 2005 Elsevier B.V. All rights reserved.
机译：研究立方氮化硼（c-BN）薄膜的表面性质对弄清其形成机理和应用非常重要。在本文中，通过射频溅射将c-BN薄膜沉积在Si衬底上。研究了工作气压对c-BN薄膜形成的影响。用X射线光电子能谱（XPS）分析了c-BN薄膜的表面，结果表明，c-BN薄膜的表面除B和N外还含有C和O元素。c-的N / B值包含立方氮化硼的BN薄膜非常接近1。基于XPS的计算表明，六方氮化硼（h-BN）在c-BN薄膜表面的厚度约为0.8 nm。 （c）2005 Elsevier B.V.保留所有权利。

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