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A New theory for evaluating the number density of inclusions in films

机译:评估薄膜中夹杂物数量密度的新理论

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A new formulation derived from thermal characters of inclusions and host films for estimating laser induced damage threshold has been deduced. This formulation is applicable for dielectric films when they are irradiated by laser beam with pulse width longer than tens picoseconds. This formulation can interpret the relationship between pulse-width and damage threshold energy density of laser pulse obtained experimentally. Using this formulation, we can analyze which kind of inclusion is the most harmful inclusion. Combining it with fractal distribution of inclusions, we have obtained an equation which describes relationship between number density of inclusions and damage probability. Using this equation, according to damage probability and corresponding laser energy density, we can evaluate the number density and distribution in size dimension of the most harmful inclusions. (c) 2005 Elsevier B.V. All rights reserved.
机译:推导了一种由夹杂物和主体薄膜的热特性得出的新公式,用于估算激光诱导的损伤阈值。当用脉冲宽度大于数十皮秒的激光束辐照介电膜时,该配方适用于介电膜。该公式可以解释实验获得的激光脉冲的脉冲宽度与损伤阈值能量密度之间的关系。使用此公式,我们可以分析哪种夹杂物是最有害的夹杂物。结合夹杂物的分形分布,我们得到了描述夹杂物数量密度与破坏概率之间关系的方程。使用该方程式,根据损伤概率和相应的激光能量密度,我们可以评估最有害夹杂物的数量密度和尺寸尺寸分布。 (c)2005 Elsevier B.V.保留所有权利。

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