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Crystallite misorientation analysis in semiconductor wafers and ELO samples by rocking curve imaging

机译:摇摆曲线成像分析半导体晶圆和ELO样品中的微晶取向错误

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Rocking curve imaging is based on measuring a series of Bragg-reflection digital topographs by monochromatic parallel-beam synchrotron radiation in order to quantify local crystal lattice rotations within a large surface area with high angular and high spatial resolution. In this paper we apply the method to map local lattice tilts in two distinct semiconductor sample types with lattice misorientations up to 0.5 degrees and with spatial resolution from 30 mu m down to I mu m. We analyse the measured surface-tilt data volumes for samples with almost smoothly varying specific misoriented defect formation in GaAs wafers and for an inherent subsurface grain structure of epitaxial lateral overgrowth wings in GaN. Backprojected tilt maps and histograms provide both local and global characteristics of the microcrystallinity. (c) 2006 Elsevier B.V. All rights reserved.
机译:摇摆曲线成像基于通过单色平行光束同步加速器辐射测量一系列布拉格反射数字形貌,以便以高角度和高空间分辨率量化大表面积内的局部晶格旋转。在本文中,我们应用该方法绘制了两种不同的半导体样品类型中的局部晶格倾斜图,这些样品类型的晶向失调最高达0.5度,空间分辨率从30微米下降到1微米。我们分析了样品的表面倾斜数据量,这些样品具有几乎平滑变化的GaAs晶片中特定的取向错误缺陷形成的样品以及GaN外延侧向过度生长翅膀的固有表面下晶粒结构。反投影的倾斜图和直方图提供了微晶度的局部和全局特征。 (c)2006 Elsevier B.V.保留所有权利。

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