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Optical characterization and microstructure of BaTiO3 thin films obtained by RF-magnetron sputtering

机译：射频磁控溅射制备BaTiO3薄膜的光学表征和微观结构

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BaTiO3 thin films were deposited on Pt/Ti/SiO2/Si by rf planar-magnetron sputtering. The films thickness increases with the decrease of both deposition pressure and sample-discharge centre distance. The films annealed at 900 degrees C, for 8 h, present direct band gap energy ranged between 3.57 and 3.59 eV. The dependence of the structure and microstructure (texture, degree of crystallinity), as well as of the optical characteristics on the deposition parameters, was analysed. Using spectroscopic ellipsometry (SE) measurements coupled with the Bruggeman Effective Medium Approximation (B-EMA), the layer structure and the surface roughness, were determined. The root mean square roughness values of the surface layer, estimated by atomic force microscopy (AFM) analyses, are ranged between 10 and 20 nm and were in good agreement with SE data. The obtained films have tetragonal unit cell and show densely packed, non-columnar morphology and hexagon-like crystallite shape. (c) 2006 Elsevier B.V. All rights reserved.
机译：通过rf平面磁控溅射将BaTiO3薄膜沉积在Pt / Ti / SiO2 / Si上。随着沉积压力和样品排出中心距离的减小，膜厚度增加。薄膜在900摄氏度下退火8小时，其直接带隙能量介于3.57和3.59 eV之间。分析了结构和微观结构（质地，结晶度）以及光学特性对沉积参数的依赖性。使用椭圆偏振光谱法（SE）以及布鲁格曼有效介质近似（B-EMA），可以确定层结构和表面粗糙度。通过原子力显微镜（AFM）分析估计的表面层的均方根粗糙度平均值在10到20 nm之间，并且与SE数据高度吻合。所获得的膜具有四方晶胞，并显示密集堆积的非柱状形态和六边形微晶形状。 （c）2006 Elsevier B.V.保留所有权利。

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