Huptake kinetics of FeTi films coated with Ni

E.M.B. Heller; A.M. Vredenberg; D.O. Boerma

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Huptake kinetics of FeTi films coated with Ni

机译：镍铁钛合金薄膜的Huptake动力学

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The H_2 storage material FeTi can be fully charged through a Ni coating in the course of hours. A mild activation, either by long H_2 exposure at RT, or annealing in 35 mbar H_2 at 150 ℃, leads to a full uptake in minutes. The enhancement of the uptake rate after activation is caused by a reduction of the Ni-oxide surface. Ni does not limit the hydrogen uptake rate once the surface is clean. However, the Ni surface is sensitive to contamination, as for instance by CO adsorbed from air.

机译：H_2存储材料FeTi可以在数小时的过程中通过Ni涂层充满电。在室温长时间暴露于H_2或在150℃在35 mbar H_2中退火而引起的轻度活化，可在几分钟内完全吸收。活化后吸收速率的提高是由于氧化镍表面的减少引起的。表面清洁后，Ni不会限制氢的吸收速率。但是，Ni表面对污染物敏感，例如被空气中吸附的CO污染。

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来源
《Applied Surface Science》 |2006年第3期|p.1150-1153|共4页
作者
E.M.B. Heller; A.M. Vredenberg; D.O. Boerma;
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作者单位

Debye Institute, Surfaces, Interfaces and Devices, Universiteit Utrecht, P.O. Box 80.000, 3508 TA Utrecht, The Netherlands;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
FeTi; Ni; hydrides; hydrogen storage; kinetics; thin films; energy storage;

机译：FeTi;Ni;氢化物;储氢;动力学;薄膜;储能;

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Huptake kinetics of FeTi films coated with Ni

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