X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001)

Chiaramonte T; Abramof E; Fabreguette F; Sacilotti M; Cardoso LP

首页> 外文期刊>Applied Surface Science >X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001)

【24h】

X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001)

机译：Si（001）上生长的TiNO和TiO2薄膜的表征中的X射线多重衍射

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

TiO2 and TiNxOy thin films grown by low pressure metal-organic chemical vapor deposition (LP-MOCVD) on top of Si(001) substrate were characterized by X-ray multiple diffraction. X-ray reflectivity analysis of TiO2[1 1 0] and TiNO[ 1 0 0] polycrystalline layers allowed to determine the growth rate (-80 angstrom/min) of TiO2 and (-40 angstrom/min) of TiNO films. X-ray multiple diffraction through the Renninger scans, i.e., phi-scans for (0 0 2)Si substrate primary reflection is used as a non-conventional method to obtain the substrate lattice parameter distortion due to the thin film conventional deposition, from where the information on film strain type is obtained. (c) 2006 Elsevier B.V. All rights reserved.

机译：通过X射线多重衍射表征了通过低压金属有机化学气相沉积（LP-MOCVD）在Si（001）衬底上生长的TiO2和TiNxOy薄膜。 TiO2 [1 1 0]和TiNO [1 0 0]多晶层的X射线反射率分析可以确定TiO2的生长速率（-80埃/分钟）和TiNO膜的（-40埃/分钟）。通过Renninger扫描（即（0 0 2）Si衬底主反射的phi扫描）进行的X射线多重衍射用作非常规方法，以获取由于薄膜常规沉积而导致的衬底晶格参数畸变。获得有关薄膜应变类型的信息。（c）2006 Elsevier B.V.保留所有权利。

著录项

来源
《Applied Surface Science》 |2006年第3期|p. 1590-1594|共5页
作者
Chiaramonte T; Abramof E; Fabreguette F; Sacilotti M; Cardoso LP;
展开▼
作者单位

Univ Estadual Campinas, IFGW, BR-13083970 Campinas, SP, Brazil;

INPE, LAS, BR-12201970 Sao Jose Dos Campos, SP, Brazil;

Univ Bourgogne, CNRS, FR 2604, Thin Films & Nanostruct Grp, F-21078 Dijon, France;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
TiO2; TiNO; MOCVD; thin film; X-ray multiple diffraction; Renninger scan; CHEMICAL-VAPOR-DEPOSITION; CRYSTALLINE PERFECTION; TITANIUM NITRIDE; TEMPERATURE;

机译：TiO2;TiNO;MOCVD;薄膜;X射线多次衍射;雷宁格扫描;化学气相沉积;结晶吸附;氮化钛;温度;

相似文献

外文文献
中文文献
专利

1. High-resolution X-ray diffraction and micro-Raman scattering studies of Ge(:Ga) thin films grown on GaAs (001) substrates by MOCVD [J] . Liu H. F., Jin Y. J., Li C. G., RSC Advances . 2016,第58期

机译：通过MOCVD在GaAs（001）基材上生长的Ge（：Ga）薄膜的高分辨率X射线衍射和微拉曼散射研究
2. STRUCTURAL CHARACTERIZATION OF STRAINED (Ba_(0.5),Sr_(0.5))TiO_3 THIN FILMS GROWN ON Si BY SYNCHROTRON X-RAY DIFFRACTION [J] . SUNGJIN JUN, SANGSUB KIM, JUNGHO JE Integrated Ferroelectrics . 2001,第1a4期

机译：同步加速器X射线衍射在Si上生长的应变（Ba_（0.5），Sr_（0.5））TiO_3薄膜的结构表征
3. Synchrotron X-ray diffraction characterization of the inheritance of GaN homoepitaxial thin films grown on selective growth substrates [J] . Lou Yanfang, Song Chulho, Chen Yanna, CrystEngComm . 2018,第20期

机译：同步X射线衍射特征在选择性生长基材上生长的GaN同性恋薄膜的遗传
4. Magnetic Microstructure of CMR La_(0.7)Sr_(0.3)MnO_3 Thin Films Grown on (001)LaAlO_3 Substrates Studied by X-Ray Diffraction and Magnetic Force Microscopy [C] . R.Desfeux, S.Bailleul, W. Prellier, 8th European Magnetic Materials and Applications Conference, Jun 7-10, 2000, Kyiv, Ukraine . 2000

机译：X射线衍射和磁力显微镜研究（001）LaAlO_3衬底上生长的CMR La_（0.7）Sr_（0.3）MnO_3薄膜的磁微结构
5. Growth and structure of ultra-thin epitaxial chromium and iron oxide films on silver(001) and silver(111): A comprehensive study accomplished by x-ray photoelectron diffraction and low energy electron diffraction. [D] . Ozturk, Osman. 2002

机译：银（001）和银（111）上超薄外延铬和氧化铁膜的生长和结构：通过X射线光电子衍射和低能电子衍射完成的综合研究。
6. Fermi surface topology in a metallic phase of VO2 thin films grown on TiO2(001) substrates [O] . Yuji Muraoka, Hiroki Nagao, Yuichiro Yao, -1

机译：在TiO2（001）衬底上生长的VO2薄膜的金属相中的费米表面拓扑
7. X-ray diffraction study of the domain structure and its stability in PbTiO3thin films grown on MgO(001) by MOCVD [O] . B.-M. Yen, R. S. Batzer, H. Chen 1996

机译：MgO（001）在MgO（001）上生长的域结构的X射线衍射研究及其在MgO（001）上生长的PTOIO3THIN薄膜的稳定性
8. X-ray diffraction study of heteroepitaxy of MOCVD grown TiO2 and VO2 films on sapphire single crystals. [R] . H. You M. L. M. Chang R. P. Chiarello D. J. Lam 1991

机译：mOCVD生长TiO2和VO2薄膜在蓝宝石单晶上的异质外延的X射线衍射研究。

X-ray multiple diffraction in the characterization of TiNO and TiO2 thin films grown on Si(001)

摘要

著录项

相似文献

相关主题

期刊订阅