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首页> 外文期刊>Applied Surface Science >Enhanced cleaning of photoresist film on a transparent substrate by backward irradiation of a Nd:YAG laser
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Enhanced cleaning of photoresist film on a transparent substrate by backward irradiation of a Nd:YAG laser

机译：通过向后照射Nd：YAG激光增强清洁透明基板上的光刻胶膜

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Laser cleaning of a photoresist (PR) on a glass substrate using ns-pulsed Nd: YAG laser was studied. The direction of the substrate facing the laser beam was varied as a main parameter as well as the power of the laser beam. The backward irradiation (BWI) of the third harmonic beam (355 nm) completely removed 1.2 μm thick PR layer with three pulses at 1.5 J/cm~2 leaving no residues behind; while the forward irradiation (FWI) at the same condition just partially cleaned it. To investigate the difference of removal mechanisms between irradiation directions, the size distributions of particulates generated during laser cleaning were observed using an optical particle counter. The concentration of micron-sized particulates increased with increasing laser fluence up to 1 J/cm~2 for FWI and 0.5 J/cm~2 for BWI and then decreased at higher fluences because the target was a very thin film. The concentration of larger particulates for BWI was much higher than that for FWI implying the difference in removal mechanisms. In consideration of the size characteristics of the particulates and the temperature profiles of the PR layer, the most probable distinct mechanism for the BWI would be a blasting due to high temperature at the PR/glass interface. The particulate number concentration decreased rapidly after the completion of cleaning, suggesting that the measurement of the particulate concentration could detect the progress of the cleaning. Our results demonstrated that the backward irradiation will be useful for the laser cleaning of film-type contaminants on an optically transparent substrate.
机译：研究了使用ns脉冲Nd：YAG激光清洁玻璃基板上的光致抗蚀剂（PR）的方法。面对激光束的衬底的方向以及激光束的功率均作为主要参数而变化。三次谐波（355 nm）的反向照射（BWI）通过三个脉冲以1.5 J / cm〜2的脉冲完全去除了1.2μm厚的PR层；而在相同条件下的前向照射（FWI）只是对其进行了部分清洁。为了研究照射方向之间的去除机理的差异，使用光学粒子计数器观察了在激光清洁过程中产生的微粒的尺寸分布。随着激光通量的增加，FWI的微米级颗粒浓度增加，最高可达1 J / cm〜2，BWI的浓度提高至0.5 J / cm〜2，然后由于通量的提高而降低，因为目标是非常薄的薄膜。 BWI的较大颗粒浓度远高于FWI，这意味着清除机理有所不同。考虑到颗粒的尺寸特征和PR层的温度分布，BWI最可能的独特机制是由于PR /玻璃界面处的高温引起的喷砂。清洁完成后，颗粒数浓度迅速下降，这表明颗粒浓度的测量可以检测清洁的进程。我们的结果表明，向后照射将对激光清洁光学透明基板上的薄膜型污染物很有用。

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