Bulk periodic structures formation on monocrystalline silicon surface under the action of compression plasma flows

Astashynski VM; Ananin SI; Emelyarlenko AS; Kostyukevich EA; Kuzmitzky AM; Zhvavy SP; Uglov VV

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Bulk periodic structures formation on monocrystalline silicon surface under the action of compression plasma flows

机译：在压缩等离子流作用下单晶硅表面上形成块状周期性结构

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摘要

The results of numerical simulation of monocrystalline silicon melting and crystallization under the action of compression plasma flow generated by quasistationary plasma accelerators with regard to phase transformations based on Kolmogorov equation are presented. Temporal and spatial characteristics of melting and crystallization processes for pulses of various forms are discussed. Based on data received and estimates made, the conclusion on substantial role of thermoelectric instability in bulk periodic structures formation was made. (c) 2006 Elsevier B.V. All rights reserved.

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来源
《Applied Surface Science》 |2006年第4期|p. 1866-1872|共7页
作者
Astashynski VM; Ananin SI; Emelyarlenko AS; Kostyukevich EA; Kuzmitzky AM; Zhvavy SP; Uglov VV;
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作者单位

Natl Acad Sci Belarus, Inst Atom & Mol Phys, Minsk 220072, Byelarus;

Natl Acad Sci Belarus, Inst Elect, Minsk 220090, Byelarus;

Belarusian State Univ, Minsk 220080, Byelarus;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
plasma processing; plasma accelerators (guns); surface modification; melting; crystallization; SIMULATION;

机译：等离子处理;等离子促进剂（枪）;表面改性;熔融;结晶;模拟;

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专利

1. Bulk periodic structures formation on monocrystalline silicon surface under the action of compression plasma flows [J] . V.M. Astashynski, S.I. Ananin, A.S. Emelyanenko, Applied Surface Science . 2006,第4期

机译：在压缩等离子流作用下单晶硅表面上形成块状周期性结构
2. Formation of submicron cylindrical structures at silicon surface exposed to a compression plasma flow [J] . Uglov VV., Astashynski VV., Astashynski VM., JETP Letters . 2001,第4期

机译：在暴露于压缩等离子流的硅表面形成亚微米圆柱结构
3. Thermal Stability of Structure and Properties of the Surface Layer of Instrumental Steel Alloyed with Zirconium and Silicon Atoms under the Action of Compression Plasma Flows [J] . N. N. Cherenda, V. V. Uglov, S. V. Gusakova, Inorganic materials: applied research . 2018,第5期

机译：压缩等离子流作用下含锆和硅原子的合金钢表面层结构和性能的热稳定性
4. Magnetic Field Influence on Silicon Surface Periodic Structures Obtained by Plasma Flow Action [C] . Dojcinovic, I.P., Kuraica, . 2006

机译：磁场对等离子流作用获得的硅表面周期性结构的影响
5. Control of bulk and interface properties in the fabrication of hydrogenated amorphous silicon films and structures by plasma CVD. [D] . Nag, Somnath S. 1992

机译：通过等离子体CVD控制氢化非晶硅膜和结构中的体积和界面特性。
6. Internal Surface Plasmon Excitation as the Root Cause of Laser-Induced Periodic Plasma Structure and Self-Organized Nanograting Formation in the Volume of Transparent Dielectric [O] . Vladimir B. Gildenburg, Ivan A. Pavlichenko 2020

机译：内表面等离子体励磁作为激光诱导的周期等离子体结构的根本原因和透明电介质体积的自组织纳米再射形成
7. Formation of silicon-based nanostructures by compression plasma flows [O] . Petukhou Yu.A., Uglov V.V., Kvasov N.T., 2011

机译：通过压缩等离子体流形成硅基纳米结构
8. Simulation of the Bulk and Surface Properties of Amorphous Hydrogenated Silicon Deposited from Silane Plasmas [R] . Kushner, M. J. 1989

机译：硅烷等离子体沉积非晶氢化硅的体积和表面性质模拟

Bulk periodic structures formation on monocrystalline silicon surface under the action of compression plasma flows

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