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Magnetic force microscopy studies of domain walls in nickel and cobalt films

机译：镍钴膜中畴壁的磁力显微镜研究

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A magnetic force microscopy is used to examine the domain walls in nickel and cobalt films deposited by argon ion sputtering. Thin nickel films deposited at high substrate temperatures exhibit coexistent Bloch and Neel walls. Films grown at room temperature display alternative Bloch lines with cap switches. These films agglomerate to form grains after annealed at high temperatures. The film composed of larger grains behaves better nucleation implying magnetic domains of closure, while the film composed of smaller grains exhibits more defects implying alternative Bloch lines. We have also observed domain displacements and cap switches, which occur due to precipitation of particles in small grain size films. Stripe domains are observed for film thicknesses larger than 100 nm. They become zigzag cells when an external field of 1.5 T is applied perpendicular to the surface of the films. This experiment indicates that the domain sizes in thin films and the strip widths for thick films both depend on the square-root of the film thickness, which varies from 5 to 45 nm and from 100 to 450 nm, respectively. (c) 2005 Elsevier B.V. All rights reserved.
机译：磁力显微镜用于检查通过氩离子溅射沉积的镍和钴膜中的畴壁。在较高的基板温度下沉积的镍薄膜会同时存在Bloch和Neel壁。在室温下生长的胶片显示带有盖开关的替代Bloch线。这些薄膜在高温退火后会聚结形成晶粒。由较大晶粒组成的薄膜表现出更好的形核，暗示了闭合的磁畴，而由较小晶粒组成的薄膜则表现出更多的缺陷，暗示了替代的布洛赫线。我们还观察到由于颗粒在小晶粒尺寸薄膜中的沉淀而发生的晶格位移和电容转换。对于大于100nm的膜厚度观察到条纹区域。当垂直于薄膜表面施加1.5 T的外部电场时，它们将变成锯齿形单元。该实验表明，薄膜的畴尺寸和厚膜的条带宽度均取决于膜厚度的平方根，其分别在5至45 nm和100至450 nm之间变化。 （c）2005 Elsevier B.V.保留所有权利。

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