Mechanism about improvement of NiSi thermal stability for Ni/Pt/Si(111) bi-layered system

Wang RN.; Feng JY.; Huang Y.

首页> 外文期刊>Applied Surface Science >Mechanism about improvement of NiSi thermal stability for Ni/Pt/Si(111) bi-layered system

【24h】

Mechanism about improvement of NiSi thermal stability for Ni/Pt/Si(111) bi-layered system

机译：Ni / Pt / Si（111）双层体系中提高NiSi热稳定性的机理

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

A thin interlayer of Pt can greatly enhance the thermal stability of NiSi films formed by rapid thermal annealing (RTA) on Si(1 1 1) substrates, as was revealed by X-ray diffraction (XRD) data and sheet resistance measurement. One possible reason for the enhanced NiSi thermal stability is attributed to the formation of the Ni0.945Pt0.055Si solid solution and its preferred orientation, leading to the decrease in the driving force and the increase in the interfacial energy change, respectively. Both of them increase the activation energy for the NiSi2 nucleation, improving the NiSi thermal stability. (C) 2002 Elsevier Science B.V. All rights reserved. [References: 14]

机译：X射线衍射（XRD）数据和薄层电阻测量表明，薄的Pt中间层可以极大地增强通过在Si（11 1）基板上进行快速热退火（RTA）形成的NiSi膜的热稳定性。 NiSi热稳定性增强的一个可能原因是Ni0.945Pt0.055Si固溶体的形成及其优选的取向，分别导致驱动力的降低和界面能变化的增加。它们都增加了用于NiSi2成核的活化能，从而提高了NiSi的热稳定性。（C）2002 Elsevier Science B.V.保留所有权利。 [参考：14]

著录项

来源
《Applied Surface Science》 |2003年第4期|p. 139-143|共5页
作者
Wang RN.; Feng JY.; Huang Y.;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
Nisi; Thermal stability; The solid solution; Films; Silicides; (111)si;

机译：妮丝热稳定性;固溶体;电影;硅化物;（111）si;

相似文献

外文文献
中文文献
专利

1. Comparison of the thermal stabilities of NiSi films in Ni/Si, Ni/Pd/Si and Ni/Pt/Si systems [J] . Wang RN., Feng JY. Journal of Physics. Condensed Matter . 2003,第12期

机译：Ni / Si，Ni / Pd / Si和Ni / Pt / Si系统中NiSi膜的热稳定性比较
2. Effect of a Ti capping layer on thermal stability of NiSi formed from Ni thin films deposited by metal-organic chemical vapor deposition using a Ni(~iPr-DAD)_2 precursor [J] . Jingyu Park, Heeyoung Jeon, Hyunjung Kim, Japanese journal of applied physics . 2015,第2期

机译：Ti覆盖层对使用Ni（〜iPr-DAD）_2前驱体通过金属有机化学气相沉积法沉积的Ni薄膜形成的NiSi热稳定性的影响
3. Ni, NiSi_2 and Si secondary ohmic contacts on SiC with high thermal stability [J] . Stanislav Cichon, Petr Machac, Jiri Vojtik Materials science forum . 2013,第期

机译：具有高热稳定性的SiC上的Ni，NiSi_2和Si次级欧姆接触
4. Novel NiSi technology utilizing Ti/Ni/TiN structure and fluorine implantation for thermal stability improvement by suppression of abnormal oxidation [C] . Jang-Gn Yun, Soon-Young Oh, Hee-Hwan Ji, Junction Technology, 2004. IWJT '04. The Fourth International Workshop on . 2004

机译：利用Ti / Ni / TiN结构和氟注入的新型NiSi技术通过抑制异常氧化来提高热稳定性
5. Thermodynamic modeling and prediction of elastic and thermal expansion properties of Ni-base superalloys: Application to Ni-Al-Pt-Cr-Hf system with gamma and gamma' phases. [D] . Kim, DongEung. 2011

机译：Ni基高温合金的热力学建模和弹性和热膨胀特性的预测：在具有伽马和伽马相的Ni-Al-Pt-Cr-Hf系统中的应用。
6. Energy Storage Systems: Tracking the Influence of Thermal Expansion and Oxygen Vacancies on the Thermal Stability of Ni‐Rich Layered Cathode Materials (Adv. Sci. 12/2020) [O] . Eunkang Lee, Shoaib Muhammad, Taewhan Kim, 2020

机译：储能系统：跟踪热膨胀和氧空位对富镍层状阴极材料热稳定性的影响（Adv。Sci。12/2020）
7. Formation and thermal stability of NiSi phase in Ni (30 nm)/Pt (2 nm; 6 nm)/Siep. (50 nm)/Si (001) thin film systems [O] . Makogon, Iu.N., Pavlova, E.P., Sidorenko, S.I., 2013

机译：Ni（30 nm）/ Pt（2 nm; 6 nm）/ Siep中NiSi相的形成和热稳定性。（50 nm）/ Si（001）薄膜系统
8. Photoemission Studies of Time-Resolved Surface Reactions: Isothermal Desorption of Co from Ni (111) [R] . Rubloff, G. W. 1979

机译：时间分辨表面反应的光电子发射研究：Ni（111）中Co的等温脱附

Mechanism about improvement of NiSi thermal stability for Ni/Pt/Si(111) bi-layered system

摘要

著录项

相似文献

相关主题

期刊订阅