Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

Blackman CS.; Carmalt CJ.; ONeill SA.; Parkin IP.; Apostolico L.; Moloy KC.

首页> 外文期刊>Applied Surface Science >Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

【24h】

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

机译：由四氯化钛和三三甲基硅烷基膦双源化学气相沉积磷化钛（III）

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

Thin films of titanium(III) phosphide (TiP) have been produced from the dual-source atmospheric pressure CVD reaction of TiCl4 and tristrimethylsilylphosphine. Analysis of the films using EDAX, SEM, glancing angle XRD and XPS is presented. (C) 2003 Elsevier Science B.V. All rights reserved. [References: 18]

著录项

来源
《Applied Surface Science》 |2003年第4期|p. 2-5|共4页
作者
Blackman CS.; Carmalt CJ.; ONeill SA.; Parkin IP.; Apostolico L.; Moloy KC.;
展开▼
作者单位

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
Cvd; Thin film; Titanium phosphide; Tristrimethylsilylphosphine; Films; Precursor; Spectra; Routes; Glass; Ticl4;

机译：Cvd;薄膜;磷化钛;三三甲基甲硅烷基膦;电影;前体;光谱;路线;玻璃;Ticl4;

相似文献

外文文献
中文文献
专利

1. Dual-source chemical vapour deposition of titanium sulfide thin films from tetrakisdimethylamidotitanium and sulfur precursors [J] . Emily S.Peters, Claire J.Carmalt, Ivan P.Parkin Journal of Materials Chemistry: An Interdisciplinary Journal dealing with Synthesis, Structures, Properties and Applications of Materials, Particulary Those Associated with Advanced Technology . 2004,第23期

机译：四源二甲基ami钛和硫前驱体双源化学气相沉积硫化钛薄膜
2. Low temperature deposition of crystalline chromium phosphide films using dual-source atmospheric pressure chemical vapour deposition [J] . Christopher S. Blackman, Claire J. Carmalt, Troy D. Manning, Applied Surface Science . 2004,第1a4期

机译：双源常压化学气相沉积法低温沉积磷化铬晶体
3. Titanium(Ⅳ) isopropoxide as a source of titanium and oxygen atoms in carbon based coatings deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition method [J] . Thin Solid Films . 2020,第Jana1期

机译：射频等离子体增强化学气相沉积法沉积碳基涂层中的异丙氧基钛（Ⅳ）作为钛和氧原子的来源
4. Selective area deposition of titanium dioxide thin films by light induced chemical vapour deposition [C] . E. Halary-Wagner, P. Lambelet, G. Benvenuti, European conference on chemical vapor deposition . 2001

机译：光诱导化学气相沉积选择性区域沉积二氧化钛薄膜
5. Synthesis of p-iron(III) oxide, n-iron(III) oxide, and carbon-modified-n-titanium dioxide and their application in self-driven photoelectrochemical cells: p-iron(III) oxide/n-iron(III) oxide, p-iron(III) oxide/carbon-modified-n-titanium dioxide, and p-gallium indium phosphide/carbon-modified-n-titanium dioxide for direct water photoelectrolysis [D] . Ingler, William B., Jr. 2005

机译：对氧化铁（III），正氧化铁（III）和碳改性的正二氧化钛的合成及其在自驱动光电化学电池中的应用：对氧化铁（III）/正铁（III））氧化物，用于水直接电解的对-氧化铁（III）/碳改性的正二氧化钛和对镓磷化铟/碳改性的正二氧化钛
6. Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl4) Precursor [O] . Woo-Jae Lee, Eun-Young Yun, Han-Bo-Ram Lee, 2020

机译：通过等离子体增强的原子层沉积使用四甲基（二甲基氨基）钛（TDMAT）和四氯化钛（TiCl4）前体制备的锡薄膜的数据集
7. PROTECTION AGAINST OXIDATION OF C/SiC COMPOSITES BY CHEMICAL VAPOUR DEPOSITION OF TITANIUM DIBORIDE : DEPOSITION KINETICS AND OXIDATION BEHAVIOUR OF FILMS PREPARED FROM TiCl4/BCl3/H2 MIXTURES [O] . C. COURTOIS, J. DESMAISON, H. TAWIL 1991

机译：通过化学气相沉积钛的二硼化物的化学气相沉积来保护C / SiC复合材料的保护：由TiCl4 / Bcl3 / H2混合物制备的膜的沉积动力学和氧化行为
8. THE VAPOUR PHASE DEPOSITION OP BORON ON TITANIUM BY THE REACTION BETWEEN GASEOUS BORON TRICHLORIDE AND TITANIUM METAL [R] . D. J. Cameron, R. A. J. Shelton 1965

机译：气相三氯化硼与钛金属反应生成钛上的气相沉积硼

Dual-source chemical vapour deposition of titanium(III) phosphide from titanium tetrachloride and tristrimethylsilylphosphine

摘要

著录项

相似文献

相关主题

期刊订阅