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首页> 外文期刊>Applied Surface Science >Optical properties of polycrystalline and epitaxial anatase and rutile TiO_2 thin films by rf magnetron sputtering
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Optical properties of polycrystalline and epitaxial anatase and rutile TiO_2 thin films by rf magnetron sputtering

机译：射频磁控溅射多晶和外延锐钛矿和金红石型TiO_2薄膜的光学性质

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摘要

We analyzed successfully the refractive index n, extinction coefficient k, and optical band gap E_g of the fabricated polycrystalline and epitaxial TiO_2 films of rutile and anatase films by spectroscopic ellipsometry (SE). The provided samples were prepared by rf magnetron sputtering of TiO_2 target with Ar gas plasma under a variety of sputtering parameters such as total pressure, Ar gas flow rate, O_2 gas flow rate, applied sputtering power, substrate temperature and substrate materials. The covered wavelength for SE was from 0.75 to 5 eV (1653―248 nm in wavelength). As the conclusion, the films show higher values of refractive indices than the previously reported ones by other authors. Optical band gaps extrapolated by Tauc plot using the obtained extinction coefficient again show higher values than the known bulk data.
机译：我们通过光谱椭偏法（SE）成功地分析了金红石和锐钛矿型多晶和外延TiO_2薄膜的折射率n，消光系数k和光学带隙E_g。所提供的样品是通过在各种溅射参数（例如总压力，Ar气体流速，O_2气体流速，施加的溅射功率，基底温度和基底材料）下用Ar气体等离子体对TiO_2靶进行射频磁控溅射制备的。 SE的覆盖波长为0.75至5 eV（波长为1653-248 nm）。结论是，这些膜显示出比其他作者先前报道的更高的折射率值。使用获得的消光系数通过Tauc曲线外推的光学带隙再次显示出比已知体数据更高的值。

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