• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Applied Surface Science >Facile fabrication of periodic arrays of vertical Si nanoholes on (001)Si substrate with broadband light absorption properties
【24h】

Facile fabrication of periodic arrays of vertical Si nanoholes on (001)Si substrate with broadband light absorption properties

机译：具有宽带光吸收特性（001）Si衬底上垂直Si纳米孔的周期阵列的容纳制造

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

This study presents a facile and straightforward approach to fabricating periodic arrays of Au nanodisks and vertically aligned, depth- and morphology-controllable Si nanoholes on (001)Si substrates by combining self-assembled nanosphere lithography, selective Au wet etching, and Au nanodisk-catalyzed Si etching processes. All of the etching experiments were carried out in aqueous solutions at room temperature without using complex photolithography and hard-mask patterning processes. The shape, diameter, and spacing of the produced vertical Si nanoholes corresponded well to those of the catalytic Au nanodisks used, and the nanohole depth could be readily tuned from sub-micrometer to several micrometers by adjusting the Au nanodisk-catalyzed Si etching time. The Si substrates with nanohole-textured surfaces exhibited depth- dependent hydrophobic behaviors and broadband (400-1650 nm) light absorption properties. The measured integrated absorptance was found to increase with increasing the depth of Au nanodisk-embedded Si nanoholes and can reach up to 95% in the visible light region and 60% in the near-IR region. The resulting broadband absorption enhancement can be attributed to the combined effects of multiple scattering of light and localized surface plasmon resonance. The obtained results present the exciting prospects that the new combined approach proposed here would offer potential applications in constructing various high-efficiency nanohole array-based optoelectronic and photovoltaic devices.
机译：本研究介绍了通过组合自组装的纳米光刻，选择性Au湿法蚀刻和Au纳米磁盘（001）Si基板上制造Au Nanodisks的周期性，深度和形态可控Si纳米孔的容易和直接的Au Nanodisk和垂直对准，深度和形态可控的Si纳米孔。催化Si蚀刻工艺。所有蚀刻实验在室温下在室温下在水溶液中进行，而不使用复杂的光刻和硬掩模图案化方法。所产生的垂直Si纳米孔的形状，直径和间隔对应于所用的催化Au纳米型纳米孔的那些，并且通过调节Au纳米敏感催化的Si蚀刻时间，纳米孔深度可以从子微米易于调谐到几微米。具有纳米骨织物表面的Si基材表现出深度依赖性疏水性行为和宽带（400-1650nm）光吸收性能。发现测量的集成吸收率随着Au纳米虫嵌入的Si纳米孔的深度而增加，并且可以在可见光区域中达到高达95％，并且在近红外区域中的60％。由此产生的宽带吸收增强可归因于光和局部表面等离子体共振的多个散射的组合效应。所得结果提出了令人兴奋的前景：这里提出的新的组合方法将提供潜在的应用，在构建各种高效纳米孔阵列的光电和光伏器件方面提供潜在的应用。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号