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首页> 外文期刊>Composite Structures >Functionally graded 'Ti-base + (Ta, Ta_2O_5)-coatings' structure and its production using induction heat treatment
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Functionally graded 'Ti-base + (Ta, Ta_2O_5)-coatings' structure and its production using induction heat treatment

机译：功能分级的“ Ti基+（Ta，Ta_2O_5）涂层”结构及其感应热处理生产

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摘要

On the surface of the "Ti-base + Ta-coating" layered system, tantalum oxide coatings were obtained by induction heat treatment (IHT) within 600-1600 degrees C for 1-120 s. It was established that in the entire range of temperature and duration of IHT, the highest oxide with an oxygen concentration C-[O] = 70.35-72.48 at.% was formed on tantalum. An oxide coating without cracks having an average grain size D-G = 170-340 nm and pore size D-p = 130-150 nm was formed at T = 1000-1050 degrees C. With an exposure time t = 30-120 sin the temperature range from 850 to 900 to 1000-1050 degrees C, high hardness values about 39-47 HRA (105-135 HV) for the tantalum layer and about 69-84 HRN15 (240-495 HV) for the near-surface layer were noted. These samples also had a superhard oxide coating with H-0.1 = 55.27 +/- 16.00 GPa and H-0.1 = 39.09 +/- 13.10 GPa. The results of the study of these samples showed that high microhardness of 1579 +/- 537 HV0.2 combined with high Rockwell hardness and low defectiveness of the oxide coating allowed the creation of a mechanically stable "Tibase + (Ta, Ta2O5)-coating" layered system.
机译：在“ Ti基+ Ta涂层”层状系统的表面上，通过感应热处理（IHT）在600-1600摄氏度下保持1-120 s来获得氧化钽涂层。已经确定，在IHT的整个温度和持续时间范围内，钽上形成了氧浓度C- [O] = 70.35-72.48 at。％的最高氧化物。在T = 1000-1050摄氏度下形成无裂纹的氧化物涂层，其平均晶粒尺寸DG = 170-340 nm，孔径Dp = 130-150 nm。暴露时间t = 30-120 sin时，温度范围为在850至900至1000-1050℃的温度下，钽层的硬度值约为39-47 HRA（105-135 HV），近表面层的硬度值约为69-84 HRN15（240-495 HV）。这些样品还具有H-0.1 = 55.27 +/- 16.00 GPa和H-0.1 = 39.09 +/- 13.10 GPa的超硬氧化物涂层。这些样品的研究结果表明，高的1579 +/- 537 HV0.2显微硬度与高的洛氏硬度和低的氧化物涂层缺陷相结合，可以形成机械稳定的“ Tibase +（Ta，Ta2O5）涂层”分层系统。

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