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首页> 外文期刊>AIP Advances >A novel magnetic field-assisted polishing method using magnetic compound slurry and its performance in mirror surface finishing of miniature V-grooves
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A novel magnetic field-assisted polishing method using magnetic compound slurry and its performance in mirror surface finishing of miniature V-grooves

机译：一种使用磁性化合物浆料的新型磁场辅助抛光方法及其在微型V型槽镜面精加工中的性能

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摘要

A novel magnetic field-assisted polishing technique was proposed for finishing 3D structuredsurface using a magnetic compound (MC)slurry. The MCslurry was prepared by blending carbonyl-iron-particles, abrasive grains and α-cellulose into a magnetic fluid which contains nano-scale magnetite particles. An experimental setup was constructed firstly by installing an oscillation worktable and a unit onto a polishing machine. Then, experimental investigations were conducted on oxygen-free copper workpiece with parallel distributed linear V-grooves to clarify the influence of the polishing time and abrasive impact angle on the grooves surface qualities. It was found that (1) the groove form accuracy, i.e. the form retention rate η varied with the polishing locations. Although the form retention rate η deteriorated during the polishing process, the final η was greater than 99.4%; (2) the effective impact angle θm affected the material removal and form accuracy seriously. An increase of the absolute value θm resulted with an increase of material removal rate and a decrease of the form accuracy; (3) the work-surface roughness decreased more than 6 times compared with the original surface after MCslurrypolishing. These results confirmed the performance of the proposed new magnetic field-assisted polishing method in the finishing of 3D-structured surface.
机译：提出了一种新颖的磁场辅助抛光技术，用于使用磁性化合物（MC）浆料精加工3D结构化表面。通过将羰基铁颗粒，磨料颗粒和α-纤维素混入含有纳米级磁铁矿颗粒的磁流体中来制备MC浆料。首先通过将振动工作台和单元安装到抛光机上来构建实验装置。然后，对具有平行分布的线性V型槽的无氧铜工件进行了实验研究，以弄清抛光时间和磨料冲击角对凹槽表面质量的影响。发现（1）凹槽形状精度，即形状保持率η随抛光位置而变化。尽管形状保持率η在抛光过程中变差，但最终η大于99.4％; （2）有效冲击角θm严重影响了材料的去除和成形精度。绝对值θm的增加导致材料去除率的提高和形状精度的降低。 （3）进行MC浆料抛光后，工作表面粗糙度比原始表面降低了6倍以上。这些结果证实了所提出的新的磁场辅助抛光方法在3D结构表面的精加工中的性能。

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