Effect of the Deposition Temperature on the Corrosion Stability of TiO<sub>2</sub> Films Prepared by Metal Organic Chemical Vapor Deposition

R. A. Antunes; M. C. L. de Oliveira; M. F. Pillis

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Effect of the Deposition Temperature on the Corrosion Stability of TiO₂ Films Prepared by Metal Organic Chemical Vapor Deposition

机译：沉积温度对金属有机化学气相沉积法制备的TiO _{2 膜腐蚀稳定性的影响}

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The aim of this study was to investigate the influence of the deposition temperature on the corrosionstability of the TiO2 layers. A metal organic chemical vapor deposition (MOCVD) system was used togrow TiO2 films at three different temperatures: 300C, 400C and 500C. The electrochemicalbehavior of the films was assessed through electrochemical impedance spectroscopy (EIS)measurements, potentiodynamic polarization curves and chronoamperometric curves. The tests wereperformed in a sodium chloride solution at room temperature. The porosity of the different films wasalso determined using an electrochemical method. The morphologies of the coatings werecharacterized by field emission scanning electron microscopy (FE-SEM) through surface and cross- sectional images and X-ray diffraction (XRD). The results pointed to a marked effect of the depositiontemperature on the structure of the TiO2 layers. The structure of the films was closely related to theircorrosion stability. The film formed at 400C yielded the highest corrosion resistance.

机译：这项研究的目的是研究沉积温度对TiO2层的腐蚀稳定性的影响。使用金属有机化学气相沉积（MOCVD）系统在三种不同温度下生长TiO2薄膜：300C，400C和500C。通过电化学阻抗谱（EIS）测量，电位动力学极化曲线和计时电流曲线评估薄膜的电化学行为。在室温下在氯化钠溶液中进行测试。还使用电化学方法确定不同膜的孔隙率。通过场发射扫描电子显微镜（FE-SEM）通过表面和横截面图像以及X射线衍射（XRD）表征涂层的形貌。结果表明沉积温度对TiO2层结构的显着影响。薄膜的结构与其腐蚀稳定性密切相关。在400℃下形成的膜具有最高的耐腐蚀性。

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《International Journal of Electrochemical Science》 |2013年第1期|共14页
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R. A. Antunes; M. C. L. de Oliveira; M. F. Pillis;
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Effect of the Deposition Temperature on the Corrosion Stability of TiO2 Films Prepared by Metal Organic Chemical Vapor Deposition

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Effect of the Deposition Temperature on the Corrosion Stability of TiO₂ Films Prepared by Metal Organic Chemical Vapor Deposition