首页> 外文期刊>International Journal of Electrochemical Science >Determination of N-Acetylcysteine by Cyclic Voltammetry Using Modified Carbon Paste Electrode with Copper Nitroprusside Adsorbed on the 3–Aminopropylsilica
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Determination of N-Acetylcysteine by Cyclic Voltammetry Using Modified Carbon Paste Electrode with Copper Nitroprusside Adsorbed on the 3–Aminopropylsilica

机译:吸附在3-氨基丙基硅胶上的硝化铜修饰碳糊电极通过循环伏安法测定N-乙酰半胱氨酸

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Copper nitroprusside was formed on aminopropylsilica silica gel (3-AS) surface (SiCuNP) previouslyprepared following two steps. These materials were thoroughly characterized by Infrared (FTIR) andcyclic voltammetry. The above techniques confirmed the successful formation of the coppernitroprusside on the silica surface. The cyclic voltammogram of CuNPSD were found to exhibit two -1 redox couples with (E 1 = 0.34 V; (E 2 = 0.76 V vs. Ag/AgCl, KCl(sat) (KCl = 1.0 mol L ; v = 20-1 (I) (II) (II) (III) mV s ) attributed to the redox processes Cu /Cu and Fe (CN)5NO/Fe (CN)5NO respectively. The second redox process ((E 2 presented by the graphite paste electrode with SiCuNP showselectrocatalytic activity for the oxidation of N-acetylcysteine. The linear range for the determination of-5 -4 -1 N-acetylcysteine was found between 9.9 10 and 8.9 10 mol L showing a detection limit of 4.18-5 -1 -2 -1 10 mol L and an amperometric sensitivity of 3.02 10 A / mol L.
机译:硝普钠铜在预先经过两个步骤制备的氨基丙基硅胶(3-AS)表面(SiCuNP)上形成。这些材料通过红外(FTIR)和循环伏安法进行了彻底表征。以上技术证实了在二氧化硅表面上成功形成了硝基硝基铜铜。发现CuNPSD的循环伏安图显示两个-1氧化还原对,其中(E 1 = 0.34 V;(E 2 = 0.76 V vs.Ag/AgCl,KCl(sat)(KCl = 1.0 mol L; v = 20-1) (I)(II)(II)(III)mV s分别归因于氧化还原过程Cu / Cu和Fe(CN)5NO / Fe(CN)5NO。第二次氧化还原过程((E2由石墨浆呈现SiCuNP电极对N-乙酰半胱氨酸的氧化具有电催化活性,测定-5 -4 -1 N-乙酰半胱氨酸的线性范围在9.9 10和8.9 10 mol L之间,检出限为4.18-5 -1- 2 -1 10 mol L和3.02 10 A / mol L的安培灵敏度。

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