ZnO Films Deposited on Glass by Means of DC Sputtering

Masato Ohmukai; Takuya Nakagawa; Ayumu Matsumoto

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ZnO Films Deposited on Glass by Means of DC Sputtering

机译：直流溅射在玻璃上沉积的ZnO薄膜

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ZnO films were deposited on glass substrates by means of a direct current (DC) sputtering technique. The physical properties of the films were investigated on the basis of X-ray diffraction measurements. It was found that as-deposited films show c-axis oriented crystal normal to the surface with the extension of c axis by 1.27% that is estimated from the shift of the peak in the X-ray diffraction pattern. Post-deposition annealing in air at higher than 400℃ eliminates the shift and sharpens the diffraction peak structure at the same time. The electrical resistivity continues to decrease from 500 Ω?cm down to 0.6 Ω?cm by annealing as high as 600℃.

机译：ZnO膜通过直流（DC）溅射技术沉积在玻璃基板上。在X射线衍射测量的基础上研究了膜的物理性质。已经发现，所沉积的膜显示出垂直于表面的c轴取向的晶体，其中c轴的延伸为1.27％，这是根据X射线衍射图案中峰的移动来估计的。在高于400℃的空气中进行沉积后退火，可消除漂移并同时锐化衍射峰结构。通过高达600℃的退火，电阻率从500Ω？cm继续降低到0.6Ω？cm。

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《Journal of Materials Science and Chemical Engineering》 |2016年第10期|共7页
作者
Masato Ohmukai; Takuya Nakagawa; Ayumu Matsumoto;
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ZnO Films Deposited on Glass by Means of DC Sputtering

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