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Effective n-type F-doped MoSe2 monolayers

机译:有效的n型F掺杂MoSe 2 单层

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Using a first-principles method, based on the Vienna Ab-initio Simulation Package (VASP), we have studied the electronic structure, formation energy and transition level of a MoSe2 monolayer doped with V and VII atoms. The numerical results show that the dopant atoms can induce magnetism, except for in the case of the As-doped system. Specifically, N- and F-doped systems exhibit magnetic nanomaterial properties, P- and As-doped systems display metallic features, and in the cases of Cl-, Br- and I-doped systems, the systems exhibit half-metallic ferromagnetism (HMF). The formation energy calculations indicate that this can be more effective for achieving n-type and p-type doped MoSe2 under Mo-rich experimental conditions. However, for the systems doped with group V atoms, the transition level decreases with increasing atomic radius, but that of those doped with VII atoms increases with increasing atomic radius. By comparing the results, we find that the transition level is only 31 meV in F-doped MoSe2 monolayers, which indicates that F impurities can offer effective n-type carriers in MoSe2 monolayers.
机译:使用第一原理方法,基于维也纳Ab-initio模拟程序包(VASP),我们研究了MoSe 2 的电子结构,形成能和跃迁能级单层掺杂了V和VII原子。数值结果表明,除了砷掺杂体系外,掺杂原子都可以感应磁性。具体而言,N和F掺杂的系统表现出磁性纳米材料的特性,P和As掺杂的系统表现出金属特征,而在Cl,Br和I掺杂的系统中,该系统表现出半金属铁磁性(HMF)。 )。形成能的计算表明,在富钼实验条件下,这对于实现n型和p型掺杂的MoSe 2 更有效。但是,对于掺杂有V族原子的体系,其跃迁能级随原子半径的增加而降低,而掺杂VII原子的体系的跃迁能级随原子半径的增加而增加。通过比较结果,我们发现掺F的MoSe 2 单层中的跃迁能级仅为31 meV,这表明F杂质可以提供有效的n型载流子。 MoSe 2 单层。

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