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The charge regulation of electronic structure and optical properties of graphitic carbon nitride under strain

机译:应变下石墨碳氮化物的电子结构和光学性质的电荷调控

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The electronic structure of the graphitic carbon nitride (g-C _(6) N _(6) ) under strain was obtained using the hybrid density functional HSE06 with a larger computational workload. The g-C _(6) N _(6) could withstand 12% of the applied tensile strain. The electronic structure of g-C _(6) N _(6) could be changed effectively under the tensile force. The band gap changed from direct to indirect under the strain and could be tuned in the range of 3.16 eV to 3.75 eV. At approximately 4% of the applied strain, there was a transition of the valence band maximum (VBM). A wider range of light absorption could be obtained under the strain. Our results provide a prospect for the future applications of two-dimensional materials in electronic and optoelectronic devices.
机译:使用具有更大计算量的混合密度函数HSE06获得了应变下的石墨氮化碳(g-C _(6)N _(6))的电子结构。 g-C _(6)N _(6)可以承受施加的拉伸应变的12%。 g-C _(6)N _(6)的电子结构可以在拉力作用下有效地改变。带隙在应变作用下从直接变为间接,可以在3.16 eV至3.75 eV的范围内调整。在施加的应变的大约4%时,价带最大值(VBM)发生了转变。在该应变下可以获得更大范围的光吸收。我们的结果为二维材料在电子和光电设备中的未来应用提供了前景。

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