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首页> 外文期刊>Bulletin of the American Physical Society >APS -2017 Annual Fall Meeting of the APS Ohio-Region Section - Event - Optical Properties of Titanium Dioxide and Vanadium Oxide Thin Films
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APS -2017 Annual Fall Meeting of the APS Ohio-Region Section - Event - Optical Properties of Titanium Dioxide and Vanadium Oxide Thin Films

机译：APS -2017 APS俄亥俄州地区分会年度秋季会议-活动-二氧化钛和氧化钒薄膜的光学特性

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摘要

Titanium dioxide films are deposited from a 99.99% pure target using magnetron sputter deposition on sapphire substrates at 20 $^o$C and 700 $^o$C. The films were then annealed in an argon/oxygen atmosphere using a rapid thermal processor at 500 $^o$C and 900 $^o$C for 5 minutes. The transmittance, reflectance and absorbance of the films are determined by UV-VIS spectrometer under normal incidence in the spectral range 200 nm $extendash$ 2500 nm. The direct and indirect bandgaps extracted from these measurements were in the range of 2.7 – 3.3 eV. Additional optical data on these films annealed after deposition as well as electrical resistivity measurements will be presented. The vanadium oxide films were made by first depositing a 200 nm-thick film of vanadium on sapphire substrate at room temperature and annealing the films in an oxygen atmosphere for 15 – 30 min at 700 $^o$C. The optical measurements revealed a low transmission of about 50% and optical bandgaps of 2.3 $textendash$ 2.6 eV.
机译：使用磁控溅射沉积法在20℃和700℃的蓝宝石衬底上从99.99％的纯靶上沉积二氧化钛薄膜。然后使用快速热处理器在氩气/氧气气氛中将膜在500℃和900℃下退火5分钟。膜的透射率，反射率和吸收率通过UV-VIS光谱仪在垂直入射下在200nm至2500nm的光谱范围内测定。从这些测量中提取的直接和间接带隙在2.7 – 3.3 eV的范围内。将介绍沉积后退火的这些薄膜的其他光学数据以及电阻率测量结果。首先在室温下在蓝宝石衬底上沉积200 nm厚的钒膜，然后在氧气气氛中以700°C的温度将其退火15至30分钟，从而制成氧化钒膜。光学测量结果显示低透射率约为50％，光学带隙为2.3 eV 2.6 eV。

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