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首页> 外文期刊>Coatings >Structure and Properties of DLC Films Deposited on Mg Alloy at Different C2H2 Flows of Magnetron Sputtering Process
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Structure and Properties of DLC Films Deposited on Mg Alloy at Different C2H2 Flows of Magnetron Sputtering Process

机译：磁控溅射工艺不同C2H2流动镁合金DLC膜的结构与性能

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Diamond-like carbon (DLC) film is widely used due to its excellent properties, such as high hardness and high wear resistance. To investigate the advantages of DLC film applied on the surface of Mg alloy, direct current (DC) pulse magnetron sputtering was used to prepare DLC film via plasma sputtering a graphite target and introducing C2H2 gas. The silicon interlayer was fabricated by sputtering the Si target. A scanning electron microscope (SEM), transmission electron microscope (TEM), a nano-indentation instrument, an electrochemical workstation and a pin-on-disc tester were employed to obtain the surface morphology, microstructure, mechanical properties, corrosion behavior and wear resistance of the obtained film, respectively. The results show that the DLC films are dense and compact, and the structure changes from amorphous to nanocrystalline with the increase of C2H2 flow. The film prepared at low C2H2 flow has larger surface roughness, lower deposition rate, higher hardness and elasticity modulus, poorer corrosion resistance and better wear resistance, compared with the film prepared at higher acetylene flow. The self-corrosion potential of the obtained DLC film is higher than ?0.95 V, the corrosion current density is 10?7 A/cm2 orders of magnitude, and the wear rate is 10?9 mm3/Nm orders of magnitude. The friction coefficient of the film is less than 0.065, the hardness is 17.3 to 22.1 MPa, and the elastic modulus is 145 to 170 MPa. The DLC films obtained on the surface of AZ91 alloy have good comprehensive properties.
机译：由于其优异的性能，如高硬度和高耐磨性，金刚石碳（DLC）薄膜被广泛使用。为了研究施加在Mg合金表面上的DLC膜的优点，使用直流（DC）脉冲磁控溅射通过等离子体溅射制备DLC膜，石墨靶并引入C 2 H 2气体。通过溅射Si靶来制造硅中间层。采用扫描电子显微镜（SEM），透射电子显微镜（TEM），纳米压痕仪，电化学工作站和销盘盘测试仪，以获得表面形态，微观结构，机械性能，腐蚀行为和耐磨性分别获得的薄膜。结果表明，DLC膜是致密且紧凑的，并且结构随着C2H2流量的增加而从非晶纳米晶体变化。与在更高的乙炔流动中制备的膜相比，在低C2H2流下制备的薄膜具有较大的表面粗糙度，较低的沉积速率，更高的硬度和弹性模量，较差的耐腐蚀性和更好的耐磨性。所得DLC膜的自腐蚀电位高于α0.95V，腐蚀电流密度为10？7A / cm2幅度，磨损率为10？9mm3 / nm的数量级。薄膜的摩擦系数小于0.065，硬度为17.3至22.1MPa，弹性模量为145至170MPa。在AZ91合金表面上获得的DLC薄膜具有良好的综合性质。

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