Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS)

Masaomi Sanekata; Hiroshi Nishida; Tatsuya Watabe; Yuki Nakagomi; Yoshihiro Hirai; Nobuo Nishimiya; Masahide Tona; Hiroaki Yamamoto; Naoyuki Hirata; Keizo Tsukamoto; Keijiro Ohshimo; Fuminori Misaizu; Kiyokazu Fuke

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Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS)

机译：从调制脉冲功率磁控溅射（MPPMS）到深度振荡磁控溅射（DOM）的延迟放电桥接两种溅射模式

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Delayed discharges due to electrical breakdown are observed in modulated pulsed pow er magnetron sputtering (MPPMS) plasma of titanium. The delayed discharge, which is remarkable with decreasing argon gas pressure, transforms the discharge current waveform from a standard modulated pulsed discharge current waveform to a comb-like discharge current waveform consisting of several pulses with high power. In addition, the delay times, consisting of statistical times and formative times in the delayed MPPMS discharges, are experimentally measured with the help of Laue plot analysis. The pressure dependence of delay times observed indicates that the delayed discharge behavior matches the breakdown characteristics well. In the present study, the delayed discharge dynamics of the comb-like discharge current waveform, which can be the origin of deep oscillation magnetron sputtering, are investigated based on measurement of the delay times and the characteristics of discharge current waveforms.

机译：在钛的调制脉冲Power磁控溅射（MPPMS）等离子体中观察到由于电击引起的延迟放电。随着氩气压减小的延迟放电，这是显着的，将放电电流波形从标准调制脉冲放电电流波形转变为由具有高功率的几个脉冲组成的梳状放电电流波形。另外，在延迟的MPPMS放电中，由延迟MPPMS放电组成的延迟时间和形成时间是通过Laue Plot分析进行实验地测量的。观察到延迟时间的压力依赖性表明延迟的放电行为与击穿特征匹配良好。在本研究中，基于测量延迟时间和放电电流波形的特性，研究了可以是深振动磁控溅射的起源的梳状放电电流波形的延迟放电动力学。

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《Plasma》 |2021年第2期|共13页
作者
Masaomi Sanekata; Hiroshi Nishida; Tatsuya Watabe; Yuki Nakagomi; Yoshihiro Hirai; Nobuo Nishimiya; Masahide Tona; Hiroaki Yamamoto; Naoyuki Hirata; Keizo Tsukamoto; Keijiro Ohshimo; Fuminori Misaizu; Kiyokazu Fuke;
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中图分类等离子体物理学;
关键词
magnetron sputteringHPPMSMPPMSDOMSdelayed dischargeelectrical breakdownbreakdown timedelay timeformative timestatistical time;

机译：磁控溅射PPMSMPMSDOMSDELAYED放电电击穿击穿时间表时代统计时间;

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专利

1. Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge [J] . Zhong-Zhen Wu, Shu Xiao, Sui-Han Cui, 中国物理快报：英文版 . 2016,第007期
2. Discharge Properties of High-Power Pulsed Unbalanced Magnetron Sputtering [J] . 牟宗信, 刘升光, 臧海荣, 等离子体科学和技术（英文版） . 2011,第006期
3. Planar Magnetron Sputtering Device： A New Generation of Magnetron Sputtering Design and Technology [J] . Z. V. Berishvili, I. I. Gadakhabadze, I. I. Kordzakhia, 物理科学与应用：英文版 . 2017,第005期
4. Effects of the sputtering power on the crystalline structure and optical properties of the silver oxide films deposited using direct-current reactive magnetron sputtering [J] . Gao Xiao-Yong, Zhang Zeng-Yuan, Ma Jiao-Min, 中国物理：英文版 . 2011,第002期
5. Effect of peak target power on the properties of Cr thin films sputtered by HiPIMS in deep oscillation magnetron sputtering (DOMS) mode [J] . F. Ferreira, R. Serra, J.C. Oliveira, Surface & Coatings Technology . 2014,第Null期

机译：在深振荡磁控溅射（DOMS）模式下峰值目标功率对HiPIMS溅射Cr薄膜性能的影响
6. Hard yet tough CrN/Si_3N_4 multilayer coatings deposited by the combined deep oscillation magnetron sputtering and pulsed dc magnetron sputtering [J] . Ou Y. X., Ouyang X. P., Liao B., Applied Surface Science . 2020,第Feba1期

机译：通过深振荡磁控溅射和脉冲直流磁控溅射相结合沉积的硬而韧的CrN / Si_3N_4多层涂层
7. Mechanical and tribological properties of CrN/TiN superlattice coatings deposited by a combination of arc-free deep oscillation magnetron sputtering with pulsed dc magnetron sputtering [J] . Ou Y. X., Lin J., Che H. L., Thin Solid Films . 2015,第NOVa2PTaA期

机译：无弧深振荡磁控溅射与脉冲直流磁控溅射相结合沉积的CrN / TiN超晶格涂层的力学和摩擦学性能
8. リフレクトロン型飛行時間質量分析計を用いたDeep Oscillation Magnetron Sputtering(DOMS)のイオン組成分析 [C] . 中込雄基, 西田寛, 西宮信夫, 応用物理学会春季学術講演会;応用物理学会 . -1

机译：使用反射型飞行质谱仪的深振动磁控溅射（DOMS）的离子组成分析
9. Comparison of high power impulse magnetron sputtering and modulated pulsed power sputtering for interconnect metallization. [D] . Meng, Liang. 2013

机译：用于互连金属化的高功率脉冲磁控溅射和调制脉冲功率溅射的比较。
10. The influence of discharge power and heat treatment on calcium phosphate coatings prepared by RF magnetron sputtering deposition [O] . Yan Yonggang, J. G. C. Wolke, Li Yubao, -1

机译：放电功率和热处理对射频磁控溅射沉积磷酸钙涂层的影响
11. Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS) [O] . Masaomi Sanekata, Hiroshi Nishida, Tatsuya Watabe, 2021

机译：从调制脉冲功率磁控溅射（MPPMS）到深振荡磁控溅射（DOMS）的延迟放电桥接两种溅射模式
12. Magnetron Sputtered Pulsed Laser Deposition Scale Up [R] . Laube, S. J. , Heyob, J. J. 2003

机译：磁控溅射脉冲激光沉积放大

Delayed Discharge Bridging Two Sputtering Modes from Modulated Pulsed Power Magnetron Sputtering (MPPMS) to Deep Oscillation Magnetron Sputtering (DOMS)

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