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Correlations between operation conditions and microstructure of LPCVD films

机译:LPCVD薄膜的工作条件与微观结构之间的关系

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摘要

New microstructural results concerning thin silicon LPCVD films from silane are presented. Numerous characterization methods have been used to study the layers microstructural evolutions in function of their elaboration conditions. On the basis of the results obtained. A qualitative mechanism of deposition has been imagined to explain the structure constitution of these films. This mechanism will be used in a next step to build a quantitave numerical model able to predict the silicon film structure in a large range of operating conditions.
机译:提出了有关硅烷硅烷LPCVD薄膜的新微观结构结果。已经使用了许多表征方法来研究层的微观结构演变及其加工条件的功能。根据获得的结果。已经设想了沉积的定性机理来解释这些膜的结构构造。下一步将使用该机制来构建能够在很大范围的工作条件下预测硅膜结构的定量数值模型。

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