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首页> 外文期刊>Environmental Science & Technology >Interaction of Silica Nanoparticles with a Flat Silica Surface through Neutron Reflectometry
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Interaction of Silica Nanoparticles with a Flat Silica Surface through Neutron Reflectometry

机译：中子反射法测量二氧化硅纳米粒子与平坦二氧化硅表面的相互作用

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摘要

Neutron reflectometry (NR) was employed to study the interaction of nanosized silica particles with a flat silica surface in aqueous solutions. Unlike other experimental tools that are used to study surface interactions, NR can provide information on the particle density profile in the solution near the interface. Two types of silica particles (25 and 100 ran) were suspended in aqueous solutions of varying ionic strength. Theoretical calculations of the surface interaction potential between a particle and a flat - silica surface using the Derjaguin-Landau-Verwey- Overbeek (DLVO) theory were compared to the experimental data. The theory predicts that the potential energy is highly dependent on the ionic strength. In high ionic strength solutions, NR reveals a high concentration of particles near the flat silica surface. Under the same conditions, theoretical calculations show an attractive force between a particle and a flat surface. For low ionic strength solutions, the particle concentration near the surface obtained from NR is the same as the bulk concentration, while depletion of particles near the surface is expected because of the repulsion predicted by the DLVO theory.
机译：中子反射法（NR）用于研究纳米二氧化硅颗粒与水溶液中平坦的二氧化硅表面的相互作用。与用于研究表面相互作用的其他实验工具不同，NR可以提供界面附近溶液中颗粒密度分布的信息。将两种类型的二氧化硅颗粒（25和100纳米）悬浮在离子强度不同的水溶液中。使用Derjaguin-Landau-Verwey-Overbeek（DLVO）理论将粒子与平坦的二氧化硅表面之间的表面相互作用电势的理论计算与实验数据进行了比较。该理论预测，势能高度依赖于离子强度。在高离子强度溶液中，NR显示出在二氧化硅平整表面附近有高浓度的颗粒。在相同条件下，理论计算显示出粒子与平坦表面之间的吸引力。对于低离子强度溶液，由NR获得的表面附近的颗粒浓度与体积浓度相同，而由于DLVO理论预测的排斥作用，预计表面附近的颗粒会耗尽。

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  • 来源
    《Environmental Science & Technology》 |2012年第8期|p.4532-4538|共7页
  • 作者

    Eunhyea Chung; Sotira Yiacoumi; Candice Halbert; John Ankner; Wei Wang; Changwoo Kim; Costas Tsouris;

  • 作者单位

    Georgia Institute of Technology, Atlanta, Georgia 30332-0373, United States,Korea Institute of Sdence and Technology, Seoul, 136-791, Korea;

    Georgia Institute of Technology, Atlanta, Georgia 30332-0373, United States;

    Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6181, United States;

    Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6181, United States;

    Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6181, United States;

    Korea Institute of Sdence and Technology, Seoul, 136-791, Korea;

    Georgia Institute of Technology, Atlanta, Georgia 30332-0373, United States,Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6181, United States;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);美国《化学文摘》(CA);
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  • 正文语种 eng
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