...
  • 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>IEEE transactions on nanotechnology >An Impedance-Based Force Control Scheme to a Plate-to-Plate Nanoimprinter
【24h】

An Impedance-Based Force Control Scheme to a Plate-to-Plate Nanoimprinter

机译：板对板纳米压印机的基于阻抗的力控制方案

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

Nanoimprint lithography (NIL) is a novel technique that utilizes direct deformation of the resist to fabricate microanometer scale patterns. NIL outperforms traditional photolithography technology for its low cost, high productivity, and high repeatability. For a general plate-to-plate NIL, it is of central importance to precisely control the embossing force during the entire embossing process to tune the orientation of the imprint head and also to guarantee the uniformity and fidelity. Existing approaches used in NIL are position-based feedback controls. However, a position signal is believed to be indirect and is more likely to be influenced by the thickness of the photoresist layer. To address this problem, in this paper, we propose a two-stage force control scheme to explicitly control the embossing force based on the impedance control framework. The first stage is to parallelize the template surface with the substrate surface using the small initial contact force before embossing. Then, the second control stage is to regulate the large embossing force to the desired value. With the proposed force control approach, the embossing force can be explicitly controlled during the entire stamp process even without a prior knowledge of the environmental parameters. Experimental tests performed on a 500-nm grating scale further illustrate and verify the effectiveness of the proposed design.
机译：纳米压印光刻（NIL）是一种新颖的技术，利用抗蚀剂的直接变形来制造微米/纳米级图案。 NIL的低成本，高生产率和高可重复性优于传统光刻技术。对于一般的板对板NIL，在整个压印过程中精确控制压印力以调整压印头的方向并确保均匀性和保真度至关重要。 NIL中使用的现有方法是基于位置的反馈控制。然而，位置信号被认为是间接的，并且更可能受到光致抗蚀剂层的厚度的影响。为了解决这个问题，本文提出了一种基于阻抗控制框架的两阶段力控制方案，以明确控制压花力。第一步是在压花之前使用较小的初始接触力使模板表面与基板表面平行。然后，第二控制阶段是将大压花力调节到所需值。利用所提出的力控制方法，即使在没有环境参数的先验知识的情况下，也可以在整个压模过程中明确控制压花力。在500纳米光栅尺上进行的实验测试进一步说明和验证了所提出设计的有效性。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号