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首页> 外文期刊>IEEE Transactions on Semiconductor Manufacturing >Sub-Resolution Assist Feature Cleanup Based on Grayscale Map
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Sub-Resolution Assist Feature Cleanup Based on Grayscale Map

机译：基于灰度图的子分辨率辅助特征清除

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As an approach of resolution enhancement technique (RET), sub-resolution assist feature (SRAF) is used to meet the pitch requirements for sparse patterns in off-axis illumination (OAI) and supplements the spatial frequencies of main patterns to improve the resolution. Rules-based SRAF (RB-SRAF) is a technique that foundry extracts SRAF placement rules from wafer data or simulation data and then apply these rules to full chip. RB-SRAF often produces a lot of conflicts. Usually, the geometric constrains are the only factors taken into account in cleaning up of these conflicts, which may lead to mistaken cleanup and be counter-productive. Therefore, it is necessary to introduce some physical factors in the course of cleanup. The transmissivity distribution of mask in hotspot region can be obtained by inverse lithography technology (ILT). And the statistical information of the grayscale map from ILT can be used for leading cleanup and keeping the SRAFs which contribute more to process window (PW). The feasibility of this method has been verified by a series of simulations.
机译：作为分辨率增强技术（RET）的一种方法，子分辨率辅助功能（SRAF）用于满足离轴照明（OAI）中稀疏图案的音高要求，并补充主要图案的空间频率以提高分辨率。基于规则的SRAF（RB-SRAF）是一种代工厂从晶圆数据或仿真数据中提取SRAF放置规则，然后将这些规则应用于完整芯片的技术。 RB-SRAF通常会产生很多冲突。通常，几何约束是清理这些冲突时要考虑的唯一因素，这可能导致清理错误并适得其反。因此，有必要在清理过程中引入一些物理因素。可以通过反光刻技术（ILT）获得热点区域中掩模的透射率分布。来自ILT的灰度图的统计信息可用于提前清理并保留SRAF，这些SRAF对过程窗口（PW）的贡献更大。通过一系列仿真验证了该方法的可行性。

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