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A new methodology for optimal RF DFT sensor design

机译:优化RF DFT传感器设计的新方法

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摘要

In this paper, a new methodology to compare the robustness of sensor structures employed in radiofrequency design for test (RF DFT) architectures for RF integrated circuits (ICs) is proposed. First, the yield loss and defect level of the test technique is evaluated using a statistical model of the Circuit under Test (obtained through non-parametric statistics and copula theory). Then, by carrying out the dispersion analysis of the sensor architecture, a figure of merit is established. This methodology reduces the number of iterations in the design flow of RF DFT sensors and makes it possible to evaluate process dispersion. The case study is a SiGe:C BiCMOS LNA tested by a single-probe measurement.
机译:在本文中,提出了一种新的方法来比较用于射频集成电路(IC)的用于测试的射频设计(RF DFT)架构中的传感器结构的鲁棒性。首先,使用被测电路的统计模型(通过非参数统计和copula理论获得)评估测试技术的良率损失和缺陷水平。然后,通过对传感器架构进行色散分析,建立品质因数。这种方法减少了RF DFT传感器设计流程中的迭代次数,并可以评估过程分散。案例研究是通过单探针测量测试的SiGe:C BiCMOS LNA。

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