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Measurement of Nano-fine Particles on Si Wafer Surface by Laser Light Scattering Method

机译:激光散射法测量硅片表面纳米微粒

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摘要

A new measuring method for particles of nanometer (nm)-order size on a Si (Silicon) wafer has been developed using a light-scattering method. In this method, a measuring system was developed to detect particles of nm-order size, by scanning the laser spot on the surface of a Si wafer. In this study, to improve the detection sensitivity for particle diameters, we attempted to discriminate detected voltage signals including the detected signal for particles and the measured noise signal for the surface of Si wafer on the photo multiplier tube (PMT).
机译:已经开发出一种使用光散射法测量Si(硅)晶片上纳米级(nm)级颗粒的新方法。在这种方法中,开发了一种测量系统,可通过扫描Si晶片表面上的激光点来检测纳米级尺寸的颗粒。在这项研究中,为了提高对粒径的检测灵敏度,我们试图区分检测到的电压信号,包括粒子的检测信号和光电倍增管(PMT)上的硅晶片表面的噪声信号。

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