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Effect of metal ion concentration in Ni-W plating solution on surface roughness of Ni-W film

机译:Ni-W电镀液中金属离子浓度对Ni-W膜表面粗糙度的影响

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摘要

Since nanopatterns are used for various purposes including solar cells, super-hydrophilicity, and biosensors, it is necessary to miniaturize the patterns on glass devices from micro-to nano-order. We have studied glass imprinting as an excellent microfabrication technology for glass devices. Uniformity of the nanopattern height is required for a mold, since a nodular structure on the Ni-W surface is recognized as a problem in Ni-W nanopattern formation. We confirmed that the Ni-W plating bath increasing metal ion concentration is effective for inhibition of the nodular structure on the Ni-W film, and succeeded in Ni-W nano pattern formation with uniform height. However, the W content rate of plated Ni-W film was reduced in exchange for enhancing the flatness of the Ni-W film. It is necessary to examine the Ni-W plating condition for obtaining planarization of the Ni-W surface and a high content rate of W in the Ni-W film. (C) 2016 The Japan Society of Applied Physics
机译:由于纳米图案被用于包括太阳能电池,超亲水性和生物传感器在内的各种目的,因此有必要将玻璃器件上的图案从微米级缩小到纳米级。我们已经研究了玻璃压印作为一种出色的玻璃设备微制造技术。模具需要纳米图案高度的均匀性,因为在Ni-W纳米图案形成中,Ni-W表面上的结节结构被认为是一个问题。我们证实,增加金属离子浓度的Ni-W镀液对抑制Ni-W膜上的节状结构是有效的,并且成功地形成了具有均匀高度的Ni-W纳米图案。但是,为了提高Ni-W膜的平坦度,降低了镀Ni-W膜的W含有率。为了获得Ni-W表面的平坦化和Ni-W膜中的W的高含有率,需要检查Ni-W的镀覆条件。 (C)2016年日本应用物理学会

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  • 来源
    《Japanese journal of applied physics》 |2016年第1s期|01AA22.1-01AA22.3|共3页
  • 作者单位

    Kanagawa Ind Technol Ctr, 705-1 Shimoimaizumi, Ebina, Kanagawa 2430435, Japan;

    Kanagawa Ind Technol Ctr, 705-1 Shimoimaizumi, Ebina, Kanagawa 2430435, Japan;

    Kanagawa Ind Technol Ctr, 705-1 Shimoimaizumi, Ebina, Kanagawa 2430435, Japan;

    Aoyama Gakuin Univ, Coll Sci & Engn, Sagamihara, Kanagawa 2525258, Japan;

    Kanagawa Ind Technol Ctr, 705-1 Shimoimaizumi, Ebina, Kanagawa 2430435, Japan;

    Nagoya Univ, Dept Aerosp Engn, Nagoya, Aichi 4648603, Japan;

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