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首页> 外文期刊>Japanese journal of applied physics >Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting
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Study of Demolding Characteristics in Step-and-Repeat Ultraviolet Nanoimprinting

机译：连续重复紫外纳米压印的脱模特性研究

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摘要

Ultraviolet (UV) nanoimprinting includes a contact process necessary for transferring nanoscale features from a mold to a UV-curable resist coated on a substrate. The demolding that comes with the contact process is a source of defects, and an obstacle to be overcome for nanodevice fabrications. In this study, we aim to execute more than 10000 times of step-and-repeat UV nanoimprinting with a single mold, tracing demolding forces and water contact angles of the mold surface as the indication of mold-resist/substrate interface and mold degradation. A condensable gas, a UV-curable resist, and a fluorosurfactant were considered in this study. It was revealed that 1,1,1,3,3-pentafluoropropane (PFP) or HFC-245fa, which is the common industrial name, as a condensable gas and a type of fluorosurfactant played an important role in minimizing the demolding impact and thus helped in increasing mold lifetime. The surfactant-added resists performed 6500 imprinting steps in PFP.
机译：紫外线（UV）纳米压印包括将纳米级特征从模具转移到涂覆在基材上的可紫外线固化的抗蚀剂所必需的接触过程。接触过程带来的脱模是缺陷的根源，也是纳米器件制造要克服的障碍。在这项研究中，我们的目标是使用单个模具执行10000次以上的分步重复UV纳米压印，跟踪脱模力和模具表面的水接触角，以指示防霉剂/基材界面和模具降解的迹象。在这项研究中考虑了可冷凝气体，可紫外线固化的抗蚀剂和含氟表面活性剂。据揭示，作为一种可冷凝气体和一种含氟表面活性剂，1,1,1,1,3,3-五氟丙烷（PFP）或HFC-245fa作为常见的工业名称，在最小化脱模影响方面起着重要作用，因此帮助延长模具寿命。添加表面活性剂的抗蚀剂在PFP中执行了6500个压印步骤。

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  • 来源
    《Japanese journal of applied physics》 |2013年第6issue2期|06GJ04.1-06GJ04.9|共9页
  • 作者

    Shuso lyoshi; Makoto Okada; Tetsuya Katase; Katsuhiko Tone; Kei Kobayashi; Shu Kaneko; Yuichi Haruyama; Masaru Nakagawa; Hiroshi Hiroshima; Shinji Matsui;

  • 作者单位

    Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    Meisyo Kiko Co., Ltd., Tanba, Hyogo 669-3634, Japan;

    Meisyo Kiko Co., Ltd., Tanba, Hyogo 669-3634, Japan;

    Institute of Multidisciplinary Research for Advanced Materials (IMRM), Tohoku University, Sendai 980-8577, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    Institute of Multidisciplinary Research for Advanced Materials (IMRM), Tohoku University, Sendai 980-8577, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    Institute of Multidisciplinary Research for Advanced Materials (IMRM), Tohoku University, Sendai 980-8577, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, Ibaraki 305-8564, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

    Laboratory of Advanced Science and Technology for Industry, University of Hyogo, Kamigori, Hyogo 678-1205, Japan,JST-CREST, Chiyoda, Tokyo 102-0075, Japan;

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