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首页> 外文期刊>Japanese journal of applied physics >Growth Control of Dry Yeast Using Scalable Atmospheric-Pressure Dielectric Barrier Discharge Plasma Irradiation
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Growth Control of Dry Yeast Using Scalable Atmospheric-Pressure Dielectric Barrier Discharge Plasma Irradiation

机译：可扩展的大气压介电阻挡放电等离子体辐射控制干酵母的生长

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摘要

We have investigated the effects of plasma irradiation on the growth of dry yeast (Saccharomyces cerevisiae) using a scalable atmospheric-pressure dielectric barrier discharge (DBD) device. NO of 380 ppm, NO_2 of 10 ppm and O_3 of 560 ppm were detected 1 mm below the discharges, which were produced by the DBD plasmas. DBD plasma irradiation of 10 to 100 s enhances the growth of yeast in the lag phase, whereas that of 120 and 150 s suppresses the growth. O_3, NO_2, photons, and heat generated by the plasma irradiation are not responsible for the growth enhancement of the dry yeast. Plasma etching has little effect on the growth of dry yeast cells. NO plays a key role in the growth enhancement of dry yeast cells.
机译：我们已经研究了使用可扩展的大气压介质阻挡放电（DBD）装置，等离子体辐射对干酵母（Saccharomyces cerevisiae）生长的影响。在DBD等离子体产生的放电以下1毫米处检测到380 ppm的NO，10 ppm的NO_2和560 ppm的O_3。 10至100 s的DBD等离子体辐照可增强酵母在迟滞期的生长，而120和150 s的DBD等离子体辐照则可抑制酵母的生长。 O_3，NO_2，光子和等离子辐射产生的热量与干酵母的生长增强无关。等离子体蚀刻对干酵母细胞的生长影响很小。 NO在干酵母细胞的生长增强中起关键作用。

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  • 来源
    《Japanese journal of applied physics》 |2012年第11issue2期|11PJ02.1-11PJ02.5|共5页
  • 作者

    Satoshi Kitazaki; Kazunori Koga; Masaharu Shiratani; Nobuya Hayashi;

  • 作者单位

    Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan;

    Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan;

    Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 819-0395, Japan;

    Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Fukuoka 816-8580, Japan;

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