Metal-Assisted Chemical Etching Using Silica Nanoparticle for the Fabrication of a Silicon Nanowire Array

著录项

• 来源
  《Japanese journal of applied physics》 |2012年第2issue2期|p.02BP09.1-02BP09.4|共4页
• 作者

  Shinya Kato; Yuya Watanabe; Yasuyoshi Kurokawa; Akira Yamada; Yoshimi Ohta; Yusuke Niwa; Masaki Hirota;

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• 作者单位

  Department of Physical Electronics, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan;

  Department of Physical Electronics, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan;

  Department of Physical Electronics, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan;

  Department of Physical Electronics, Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan Photovoltaics Research Center (PVREC), Tokyo Institute of Technology, Meguro, Tokyo 152-8552, Japan;

  Advanced Materials Laboratory, Nissan Research Center, Yokosuka, Kanagawa 237-8523, Japan;

  Advanced Materials Laboratory, Nissan Research Center, Yokosuka, Kanagawa 237-8523, Japan;

  Advanced Materials Laboratory, Nissan Research Center, Yokosuka, Kanagawa 237-8523, Japan;

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• 原文格式 PDF
• 正文语种 eng
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