In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO_2 on Silicon Substrate

Seung Youb Lee; Cheolho Jeon; Seok Hwan Kim; Yooseok Kim; Woosung Jung; Ki-Seok An; Chong-Yun Park

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In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO_2 on Silicon Substrate

机译：硅衬底上TiO_2原子层沉积的原位X射线光电子能谱研究

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In-situ X-ray photoemission spectroscopy (XPS) has been used to investigate the initial stages of TiO_2 growth on a Si(001) substrate by atomic layer deposition (ALD). The core level spectra of Si 2p, C 1s, O1s, and Ti 2p were measured at every half reaction in the titanium tetra-isopropoxide (TTIP)-H_2O ALD process. The ligand exchange reactions were verified using the periodic oscillation of the C 1s concentration, as well as changes in the hydroxyl concentration. XPS analysis revealed that Ti2O_3 and Si oxide were formed at the initial stages of TiO_2 growth. A stoichiometric TiO_2 layer was dominantly formed after two cycles and was chemically saturated after four cycles.

机译：原位X射线光电子能谱（XPS）已用于研究通过原子层沉积（ALD）在Si（001）衬底上TiO_2生长的初始阶段。在四异丙氧基钛（TTIP）-H_2O ALD工艺的每半个反应中测量Si 2p，C 1s，O1s和Ti 2p的核心能级谱。使用C 1s浓度的周期性振荡以及羟基浓度的变化来验证配体交换反应。 XPS分析表明，在TiO_2生长的初始阶段形成了Ti2O_3和Si氧化物。在两个循环后主要形成化学计量的TiO_2层，并在四个循环后化学饱和。

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《Japanese journal of applied physics》 |2012年第3issue1期|p.031102.1-031102.3|共3页
作者
Seung Youb Lee; Cheolho Jeon; Seok Hwan Kim; Yooseok Kim; Woosung Jung; Ki-Seok An; Chong-Yun Park;
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BK21 Physics Research Division, Department of Energy Science, and Center for Nanotubes and Nanostructured Composites (CNNC),Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea;

BK21 Physics Research Division, Department of Energy Science, and Center for Nanotubes and Nanostructured Composites (CNNC),Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea;

Thin Film Material Research Team, Korea Research Institute of Chemical Technology,Yuseong P. O. Box 107, Daejon 305-600, Republic of Korea;

BK21 Physics Research Division, Department of Energy Science, and Center for Nanotubes and Nanostructured Composites (CNNC),Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea;

BK21 Physics Research Division, Department of Energy Science, and Center for Nanotubes and Nanostructured Composites (CNNC),Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea;

Thin Film Material Research Team, Korea Research Institute of Chemical Technology,Yuseong P. O. Box 107, Daejon 305-600, Republic of Korea;

BK21 Physics Research Division, Department of Energy Science, and Center for Nanotubes and Nanostructured Composites (CNNC),Sungkyunkwan University, Suwon, Gyeonggi 440-746, Republic of Korea;

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In-situ X-ray Photoemission Spectroscopy Study of Atomic Layer Deposition of TiO_2 on Silicon Substrate

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