Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and CI_2/Xe-lnductively Coupled Plasma Etching

Akihiro Matsutani; Yuuki Hashidume; Hideo Ohtsuki; Fumio Koyama

首页> 外文期刊>Japanese journal of applied physics >Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and CI_2/Xe-lnductively Coupled Plasma Etching

【24h】

Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and CI_2/Xe-lnductively Coupled Plasma Etching

机译：热纳米压印光刻技术和CI_2 / Xe电感耦合等离子体刻蚀对硅基高折射率光栅结构进行微细加工

获取原文

获取原文并翻译 | 示例

掌桥外文数据库（机构版） >>

开具论文收录证明 >>

文献代查 >>

页面导航

摘要
著录项
相似文献
相关主题

摘要

We demonstrated the fabrication of a Si-based high-index-contrast-grating (HCG) structure by thermal nanoimprint lithography and CI2/Xe-inductively coupled plasma (ICP) etching. A vertical etching profile and a smooth etched surface, which satisfy the requirements for optical device application, were obtained. We believe that this proposed process is useful for the microfabrication of Si-based optical devices, such as the HCG structure, photonic crystals, narrow optical waveguides, and micro-electro-mechanical systems (MEMS).

机译：我们演示了通过热纳米压印光刻技术和CI2 / Xe电感耦合等离子体（ICP）蚀刻制造的基于Si的高折射率对比光栅（HCG）结构。获得了满足光学器件应用要求的垂直蚀刻轮廓和光滑的蚀刻表面。我们认为，该提议的过程对于基于HCG结构，光子晶体，窄光波导和微机电系统（MEMS）的基于Si的光学器件的微制造很有用。

著录项

来源
《Japanese journal of applied physics》 |2012年第6issue2期|p.06FF05.1-06FF05.4|共4页
作者
Akihiro Matsutani; Yuuki Hashidume; Hideo Ohtsuki; Fumio Koyama;
展开▼
作者单位

Semiconductor and MEMS Processing Center, Technical Department Tokyo Institute of Technology, Yokohama 226-8503, Japan;

Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

Samco Inc., Kyoto 612-8443, Japan;

Precision and Intelligence Laboratory, Tokyo Institute of Technology, Yokohama 226-8503, Japan;

展开▼
收录信息
原文格式 PDF
正文语种 eng
中图分类
关键词

相似文献

外文文献
专利

1. Comparative study of Cl_2, CI_2/O_2, and CI_2/N_2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP [J] . C. F. Carlstroem, R. van der Heijden, M. S. P. Andriesse, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structures . 2008,第5期

机译：Cl_2，CI_2 / O_2和CI_2 / N_2感应耦合等离子体工艺刻蚀InP中高纵横比光子晶体孔的比较研究
2. Nanometer scale patterning of GaN using nanoimprint lithography and Inductively Coupled Plasma etching [J] . M. Ekielski, M. Juchniewicz, M. Pluska, Microelectronic Engineering . 2015,第feba期

机译：使用纳米压印光刻技术和电感耦合等离子体蚀刻技术对GaN进行纳米级图案化
3. Highly selective dry etching of alternating phase-shift mask (PSM) structures for extreme ultraviolet lithography (EUVL) using inductively coupled plasmas (ICP) [J] . H.Y. Jung, Y.R. Park, H.J. Lee, Thin Solid Films . 2009,第14期

机译：使用感应耦合等离子体（ICP）的极紫外蚀刻（EUVL）的交替相移掩模（PSM）结构的高度选择性干法蚀刻
4. Comparison of Pt Etching Characteristics with SF_6 and CI_2 Plasma Chemistries [C] . Sang Hoon Kim, Sup-Youl Ju, Jinho Ahn 2001 International Microprocesses and Nanotechnology Conference, Oct 31-Nov 2, 2001, Shimane, Japan . 2001

机译：SF_6和CI_2等离子体化学对Pt蚀刻特性的比较
5. Nanostructured surfaces using thermal nanoimprint lithography: Applications in thin membrane technology, piezoelectric energy harvesting and tactile pressure sensing. [D] . Nabar, Bhargav Pradip. 2013

机译：使用热纳米压印光刻技术的纳米结构表面：在薄膜技术，压电能量收集和触觉压力感测中的应用。
6. Integrated 3D Hydrogel Waveguide Out-Coupler by Step-and-Repeat Thermal Nanoimprint Lithography: A Promising Sensor Device for Water and pH [O] . Achille Francone, Timothy Kehoe, Isabel Obieta, 2018

机译：通过分步重复热纳米压印光刻技术实现的集成3D水凝胶波导输出耦合器：一种有前途的水和pH传感器设备
7. Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures [O] . Arne Schleunitz, Christian Spreu, Marko Vogler, 2011

机译：结合Nanoimprint光刻和分子量选择性热回流来产生混合3D结构的产生

Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and CI_2/Xe-lnductively Coupled Plasma Etching

摘要

著录项

相似文献

相关主题

期刊订阅