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首页> 外文期刊>Japanese journal of applied physics >Effects of Deposition Time Duration on Thermal Diffusivity of Hydrogenated Amorphous Carbon Films
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Effects of Deposition Time Duration on Thermal Diffusivity of Hydrogenated Amorphous Carbon Films

机译：沉积时间对氢化非晶碳膜热扩散率的影响

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摘要

In the present investigation we study the effects of film-deposition time duration on thermal diffusivity (a) of hydrogenated amorphous carbon (a-C:H) thin-films grown in a radio-frequency (RF) plasma enhanced chemical vapor deposition system. A set of films was deposited at 50 W RF power for 40, 60, 80, and 100min. Film characteristics were determined from the optical transmission spectroscopy, Fourier Transform Infrared spectroscopy, and Raman spectroscopy. Thermal diffusivity of a-C:H films was evaluated using the optical pump-and-probe technique on the aluminum-coated samples. Results show a trend of increase in or as the deposition time increases due to the microstructural changes associated with longer exposure to ion bombardment effects on the growth surface of the films.
机译：在本研究中，我们研究了薄膜沉积持续时间对在射频（RF）等离子体增强化学气相沉积系统中生长的氢化非晶碳（a-C：H）薄膜的热扩散率（a）的影响。在50 W RF功率下沉积一组膜40、60、80和100min。由光学透射光谱，傅立叶变换红外光谱和拉曼光谱确定膜的特性。使用光学泵浦和探针技术对涂铝的样品评估a-C：H薄膜的热扩散率。结果表明，由于与暴露在膜的生长表面上的离子轰击作用时间更长相关的微观结构变化，沉积时间增加或随沉积时间增加而增加。

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  • 来源
    《Japanese journal of applied physics》 |2011年第12期|p.125602.1-125602.6|共6页
  • 作者

    Yun Young Kim; Hasan Adli Alwi; Rozidawati Awang; Sridhar Krishnaswamy;

  • 作者单位

    Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, U.S.A;

    School of Applied Physics, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia;

    School of Applied Physics, Universiti Kebangsaan Malaysia, 43600 Bangi, Selangor, Malaysia;

    Department of Mechanical Engineering, Northwestern University, Evanston, IL 60208, U.S.A;

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