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首页> 外文期刊>Japanese journal of applied physics >Application of Novel Ultrasonic Cleaning Equipment That Uses the Waveguide Mode for the Single-Wafer Cleaning Process
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Application of Novel Ultrasonic Cleaning Equipment That Uses the Waveguide Mode for the Single-Wafer Cleaning Process

机译：使用波导模式的新型超声波清洗设备在单晶圆清洗过程中的应用

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摘要

We demonstrate single-wafer cleaning using waveguide-type ultrasonic equipment. The waveguide vibrates as a Lamb wave, and ultrasonic waves of 900 kHz, which is within the megasonic frequency range, radiate from the waveguide side. The waveguide creates a traveling wave field between the waveguide side and wafer surface owing to ultrasonic absorption into the water at the waveguide end. For a traveling wave field, the obtained particle removal efficiency (PRE) was as good as that obtained with conventional batch-type equipment, and cavitation bubble collapse, which induces pattern defects on semiconductor devices, was suppressed. Cavitation bubble collapse was observed using wafers coated with photoresist film, and images of sonoluminescence were captured with a charge coupled device (CCD) camera system.
机译：我们演示了使用波导型超声设备进行单晶圆清洗。波导作为兰姆波振动，并且从波导侧辐射在兆赫兹频率范围内的900 kHz的超声波。由于超声波吸收到波导末端的水中，波导在波导侧面和晶片表面之间产生了行波场。对于行波场，所获得的颗粒去除效率（PRE）与常规间歇式设备所获得的一样，并且抑制了在半导体器件上引起图案缺陷的气蚀气泡塌陷。使用涂有光致抗蚀剂膜的晶圆观察到气蚀气泡破裂，并且通过电荷耦合器件（CCD）摄像系统捕获了声致发光的图像。

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  • 来源
    《Japanese journal of applied physics》 |2011年第5issue2期|p.05EC10.1-05EC10.5|共5页
  • 作者

    Kazunari Suzuki; Yasuhiro Imazeki; Ki Han; Shoichi Okano; Junichiro Soejima; Yoshikazu Koike;

  • 作者单位

    Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan;

    Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan;

    Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan;

    Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan;

    Development and Engineering Department, Industrial Cleaning Equipment Division, Kaijo Corporation, Hamura, Tokyo 205-8607, Japan;

    Faculty of Engineering, Shibaura Institute of Technology, Koto, Tokyo 135-8548, Japan;

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