Oxygen-Plasma-Treated Indium-Tin-Oxide Films on Nonalkali Glass Deposited by Super Density Arc Plasma Ion Plating

Soo Young Kim; Kihyon Hong; Jun Ho Son; Gwan Ho Jung; Jong-Lam Lee; Kyu Han Choi; Kyu Ho Song; Kyung Chul Ahn

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Oxygen-Plasma-Treated Indium-Tin-Oxide Films on Nonalkali Glass Deposited by Super Density Arc Plasma Ion Plating

机译：超高密度电弧等离子体离子镀在无碱玻璃上沉积氧等离子体处理的铟锡氧化物薄膜

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摘要

The effects of O_2 plasma treatment on both the chemical composition and work function of an indium-tin-oxide (ITO) film were investigated. ITO films were deposited on non-alkali glass substrate by super density arc plasma ion plating for application in a

机译：研究了O_2等离子体处理对氧化铟锡（ITO）膜的化学组成和功函数的影响。通过超密度电弧等离子体离子电镀将ITO膜沉积在无碱玻璃基板上，以用于有机玻璃。

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《Japanese journal of applied physics》 |2008年第2issue1期|862-866|共5页
作者
Soo Young Kim; Kihyon Hong; Jun Ho Son; Gwan Ho Jung; Jong-Lam Lee; Kyu Han Choi; Kyu Ho Song; Kyung Chul Ahn;
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indium tin oxide; super density arc plasma ion plating; O_2 plasma treatment; synchrotron radiation photoemission spectroscopy; non-alkali glass; organic light-emitting diode;

机译：氧化铟锡超密度电弧等离子体离子镀;O_2等离子体处理;同步辐射光发射光谱无碱玻璃有机发光二极管;

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专利

1. Enhancement of physical properties of indium tin oxide deposited by super density arc plasma ion plating by O_2 plasma treatment [J] . Soo Young Kim, Kihyon Hong, Jong-Lam Lee, Solid-State Electronics . 2008,第1期

机译：O_2等离子体处理增强超密度电弧等离子体离子镀沉积铟锡氧化物物理性能
2. Properties of carbon nitride (CN-x) films deposited by a high-density plasma ion plating method [J] . Liang-Yih Chen, Chiao-Yang Cheng, Franklin Chau-Nan Hong Diamond and Related Materials . 2002,第3a6期

机译：高密度等离子体离子镀法沉积的氮化碳（CN-x）膜的性能
3. Well-defined (0001)-oriented aluminum nitride polycrystalline films on amorphous glass substrates deposited by ion plating with direct-current arc discharge [J] . Nomoto Junichi, Tsuchiya Tetsuo, Yamamoto Tetsuya Applied Surface Science . 2019,第JUNa1期

机译：通过直流电弧放电离子镀在非晶态玻璃基板上清晰定义的（0001）取向氮化铝多晶膜
4. Cavitation-resistant TiNi films deposited by using cathodic arc plasma ion plating [C] . J.L. He, K.W. Won, C.T. Chang, The International Conference on Erosive and Abrasive Wear (ICEAW), Incorporating the 9th International Conference on Erosion by Liquid and Solid Impact (ELSI IX), Cambridge, UK, 13-17 September 1998 . 1998

机译：阴极电弧等离子体离子镀沉积的抗气蚀TiNi膜
5. Characterization and optimization of microhardness of diamondlike carbon films deposited from RF inductively coupled plasmas [D] . Bao, Tianming 2000

机译：射频感应耦合等离子体沉积的类金刚石碳膜的表征和优化显微硬度
6. Photo-Induced Super-hydrophilic Thin Films on Quartz Glass by UV Irradiation of Precursor Films Involving a Ti(IV) Complex at Room Temperature [O] . Hsiang-Jung Wu, Kota Tanabe, Hiroki Nagai, 2019

机译：室温下含Ti（IV）配合物的前体膜的紫外线辐射在石英玻璃上光诱导超亲水薄膜
7. The Research of the C-doped TiO2 Films Deposited by Arc Ion Plating [O] . Shujuan Zhanga, Mingsheng Lib, Zhiqin Chenc, 2015

机译：电弧离子镀C掺杂TiO2薄膜的研究

Oxygen-Plasma-Treated Indium-Tin-Oxide Films on Nonalkali Glass Deposited by Super Density Arc Plasma Ion Plating

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