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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Structure of Diamond-Like Carbon Film Deposited on Aluminum Oxide Surface with Microstructure
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Structure of Diamond-Like Carbon Film Deposited on Aluminum Oxide Surface with Microstructure

机译:微观结构沉积在氧化铝表面的类金刚石碳膜的结构

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摘要

We investigated the deposition phenomena of diamond-like carbon (DLC) film on a microstructured Al_2O_3 surface using an ion-beam technique. In the case of an acceleration voltage of 300 V, the microstructured Al_2O_3 surface was smoothly coated to have an unevenness of about 200 nm height with DLC film. The hardness of the DLC film indicated maximum values at acceleration voltages of 100-200 V and gradually decreased for acceleration voltages of 300-400 V. By using Raman spectroscopy and Fourier transform infrared spectroscopy, it was shown that the numbers of sp~3 bonds in films deposited at acceleration voltages of 100 and 200 V was larger than that of films deposited at acceleration voltages of 300 and 400 V.
机译:我们使用离子束技术研究了类金刚石碳(DLC)膜在微结构化的Al_2O_3表面上的沉积现象。在300V的加速电压的情况下,用DLC膜平滑地涂覆微结构化的Al_2O_3表面以具有约200nm高度的不均匀性。 DLC膜的硬度在100-200 V的加速电压下显示最大值,而在300-400 V的加速电压下逐渐降低。通过拉曼光谱和傅里叶变换红外光谱,表明sp〜3键的数目在以100和200 V的加速电压沉积的膜中的d大于在以300和400 V的加速电压沉积的膜中的d。

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