Electrical Characterization Techniques of Dielectric Thin Films Using Metal-Insulator-Metal Structures

Yukio Fukuda; Yohei Otani; Hiroshi Toyota; Toshiro Ono

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Electrical Characterization Techniques of Dielectric Thin Films Using Metal-Insulator-Metal Structures

机译：金属-绝缘体-金属结构介电薄膜的电学表征技术

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摘要

In this paper, we describe an electrical characterization technique of dielectric thin films using metal-insulator-metal (MIM) structures and an LCR meter. It is demonstrated theoretically and experimentally that the equivalent parallel conductance and equivalent parallel capacitance of MIM capacitors necessarily show artificial frequency dispersions due to the effects of series resistance, owing to electrode and probing contact resistances. A procedure to extract the true equivalent parallel conductance and capacitance from measured admittance data is presented.

机译：在本文中，我们描述了使用金属-绝缘体-金属（MIM）结构和LCR计的介电薄膜的电表征技术。从理论上和实验上证明，由于电极和探针接触电阻的影响，由于串联电阻的影响，MIM电容器的等效并联电导和等效并联电容必然表现出人为的频率色散。提出了从测得的导纳数据中提取真正等效并联电导和电容的过程。

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来源
《Japanese journal of applied physics》 |2007年第10bpt1期|6984-6986|共3页
作者
Yukio Fukuda; Yohei Otani; Hiroshi Toyota; Toshiro Ono;
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作者单位

Tokyo University of Science, Suwa, 5000-1 Toyohira, China, Nagano 391-0292, Japan;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
dielectric; thin film; MIM structure; electrical characterization; equivalent circuit analyses; Ta_2O_5;

机译：电介质薄膜;MIM结构;电气特性等效电路分析;Ta_2O_5;

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Electrical Characterization Techniques of Dielectric Thin Films Using Metal-Insulator-Metal Structures

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