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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Temperature and Density of CF Radicals in 60 MHz Capacitively Coupled Fluorocarbon Gas Plasma
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Temperature and Density of CF Radicals in 60 MHz Capacitively Coupled Fluorocarbon Gas Plasma

机译：60 MHz电容耦合碳氟化合物气体等离子体中CF自由基的温度和密度

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摘要

Both optical emission spectroscopy and infrared diode laser absorption spectroscopy were applied to measurements of rotational temperatures of CF radicals in 60 MHz capacitively coupled CF_4 and CF_4/Ar plasmas. The rotational temperature of CF radicals in the excited state was determined by fitting the optical emission spectra with the calculation results. The calculation for emission spectra was performed using two different rotational constant value of A = 0.76 and 4.48 for the B~2Δ state, and then the constant A was evaluated to be 0.76 from the emission intensities. In the CF_4 plasma, the CF rotational temperature was increased from 300 to 380 K as the 60 MHz power was increased from 300 to 1500 W, and the radical density was increased from 1.59 x 10~(12) to 5.05 x 10~(12) cm~(-3). On the other hand, in the CF_4/Ar plasma, the CF rotational temperature was increased by 20 K with the power, and the radical density was constant at 1.1 x 10~(12) cm~(-3). It was found that the rotational temperatures of CF radicals in the excited state were in equilibrium with those in the ground state under the present conditions.
机译：将光发射光谱法和红外二极管激光吸收光谱法都用于测量60 MHz电容耦合CF_4和CF_4 / Ar等离子体中CF自由基的旋转温度。通过将光发射光谱与计算结果拟合来确定处于激发态的CF自由基的旋转温度。对于B〜2Δ状态，使用两个不同的旋转常数A = 0.76和4.48进行发射光谱的计算，然后根据发射强度将常数A评估为0.76。在CF_4等离子体中，随着60 MHz功率从300 W增加到1500 W，CF旋转温度从300 K增加到380 K，自由基密度从1.59 x 10〜（12）增加到5.05 x 10〜（12） ）cm〜（-3）。另一方面，在CF_4 / Ar等离子体中，CF旋转温度随功率增加了20K，并且自由基密度恒定在1.1×10〜（12）cm〜（-3）。发现在当前条件下，处于激发态的CF自由基的旋转温度与处于基态的CF自由基的旋转温度处于平衡状态。

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