首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Silicon Nitride Two-Level-Temperature Passivation on InP/InGaAsP Light-Emitting Diodes
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Silicon Nitride Two-Level-Temperature Passivation on InP/InGaAsP Light-Emitting Diodes

机译:InP / InGaAsP发光二极管上的氮化硅二级温度钝化

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摘要

The use of silicon nitride with a two-level temperature technique is proposed for the passivation of InP-based devices. InGaAsP/InP light-emitting diodes (LEDs) were fabricated by this passivation technique. The reverse current was decreased by about two orders of magnitude, and light-current linearity at a low current was improved.
机译:提出了将氮化硅与两级温度技术一起用于InP基器件的钝化。通过该钝化技术制造了InGaAsP / InP发光二极管(LED)。反向电流减小了大约两个数量级,并且在低电流下的光电流线性度得到改善。

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