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首页> 外文期刊>Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers >Fabrication of Carbon Nanowalls Using Novel Plasma Processing
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Fabrication of Carbon Nanowalls Using Novel Plasma Processing

机译：使用新型等离子体处理技术制造碳纳米墙

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摘要

Carbon nanowalls (CNWs), i.e., two-dimensional carbon nanostructures, were fabricated using fluorocarbon capacitively coupled plasma-enhanced chemical vapor deposition assisted by H radical injection. The correlation between CNW growth and the fabrication conditions was investigated. The morphologies of CNWs were dependent on the types of carbon source gases and the amount of H radicals injected. Moreover, straight and aligned CNWs with regular spacing were fabricated on the substrate set perpendicular to the electrode. In addition, H and CF_x (x = 1-3) radical densities in the plasma were measured using vacuum ultraviolet absorption spectroscopy and appearance mass spectrometry, respectively, to clarify the growth mechanism of CNWs. The density ratio of H radicals to CF_x radicals was found to be an important factor responsible for the formation of CNWs from fluorocarbon/hydrogen systems and increased drastically as a result of H radical injection.
机译：碳纳米壁（CNW），即二维碳纳米结构，是通过H自由基注入辅助的碳氟化合物电容耦合等离子体增强化学气相沉积法制成的。研究了CNW生长与制造条件之间的相关性。 CNW的形态取决于碳源气体的类型和注入的H自由基的数量。此外，在垂直于电极的基板组上制造了具有规则间隔的直且对齐的CNW。另外，分别使用真空紫外吸收光谱法和外观质谱法测量血浆中的H和CF_x（x = 1-3）自由基密度，以阐明CNW的生长机理。发现H自由基与CF_x自由基的密度比是导致由碳氟化合物/氢系统形成CNW的重要因素，并且由于H自由基的注入而急剧增加。

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