Growth Manner and Mechanical Characteristics of Amorphous Carbon Nanopillars Grown by Electron-Beam-Induced Chemical Vapor Deposition

Satoshi Okada; Takahito Mukawa; Ryota Kobayashi; Jun-ichi Fujita; Masahiko Ishida; Toshinari Ichihashi; Yukinori Ochiai; Takashi KAITO; Shinji Matsui

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Growth Manner and Mechanical Characteristics of Amorphous Carbon Nanopillars Grown by Electron-Beam-Induced Chemical Vapor Deposition

机译：电子束诱导化学气相沉积法生长非晶碳纳米柱的生长方式和力学特性

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We investigated the growth manner and mechanical characteristics of amorphous carbon (a-C) nanopillars formed by electron-beam-induced chemical vapor deposition (EB-CVD). The pillars' inclinations were well explained if we assumed the vertical growth rate to be almost constant within a specified distance from the substrate. The pillars' Young's modulus evaluated by deflection measurement was approximately 29 GPa, which was almost equivalent to that of bismuth, but much smaller than that observed in focused ion-beam-induced chemical vapor deposition (FIB-CVD) pillars.

机译：我们研究了通过电子束诱导化学气相沉积（EB-CVD）形成的非晶碳（a-C）纳米柱的生长方式和力学特性。如果我们假设垂直生长速率在距基材一定距离内几乎恒定，则可以很好地解释支柱的倾斜度。通过挠曲测量评估的支柱的杨氏模量约为29 GPa，几乎与铋相当，但比聚焦离子束诱导化学气相沉积（FIB-CVD）支柱所观察到的要小得多。

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来源
《Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers》 |2005年第7b期|p.5646-5650|共5页
作者
Satoshi Okada; Takahito Mukawa; Ryota Kobayashi; Jun-ichi Fujita; Masahiko Ishida; Toshinari Ichihashi; Yukinori Ochiai; Takashi KAITO; Shinji Matsui;
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作者单位

CREST JST, Japan Science and Technology Co., 4-1-8, Hon-cho, Kawaguchi, Saitama 332-0012, Japan;

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原文格式 PDF
正文语种 eng
中图分类应用物理学;
关键词
EB-CVD; amorphous carbon nanopillar; lateral growth; growth manner; young's modulus; deflection measurement;

机译：EB-CVD;非晶碳纳米柱;侧向生长;生长方式;杨氏模量;挠度测量;

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1. Density estimation for amorphous carbon nanopillars grown by focused ion beam assisted chemical vapor deposition [J] . Masahiko Ishida, Jun-ichi Fujita, Yukinori Ochiai Journal of Vacuum Science & Technology. B, Microelectronics Processing and Phenomena . 2002,第6期

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2. Optical, mechanical and etch properties of amorphous carbon nitride films grown by plasma enhanced chemical vapor deposition at room temperature [J] . Sang Hoon Kim, Cheol Min Choi, Kil Mok Lee Synthetic Metals . 2010,第23a24期

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3. The characteristic of as-grown and post-annealed nitrogen doped amorphous carbon thin films deposited by surface wave microwave plasma enhanced chemical vapor deposition method [J] . Rusop M, Abdullah S, Adhikari S, Surface review and letters . 2006,第5期

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4. Comparison of characteristics of carbon nanotubes grown by plasma enhanced chemical vapor deposition and thermal chemical vapor deposition [C] . Ha Jin Kim, In Taek Han, Young Jun Park, The Meeting of the Electrochemical Society . 2003

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5. Characterization of amorphous silicon carbide and silicon carbonitride thin films synthesized by polymer-source chemical vapor deposition. Mechanical structural and metal-interface properties [D] . Awad, Yousef 2006

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6. On the Growth and Microstructure of Carbon Nanotubes Grown by Thermal Chemical Vapor Deposition [O] . Sangeeta Handuja, P Srivastava, VD Vankar 2010

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7. Effects of Ion Bombardment Energy Flux on Chemical Compositions and Structures of Hydrogenated Amorphous Carbon Films Grown by a Radical-Injection Plasma-Enhanced Chemical Vapor Deposition [O] . Hirotsugu Sugiura, Hiroki Kondo, Takayoshi Tsutsumi, 2019

机译：离子轰击能量通量对自由基注入等离子体增强化学气相沉积生长的化学成分对化学成分的影响和氢化非晶碳膜的结构

Growth Manner and Mechanical Characteristics of Amorphous Carbon Nanopillars Grown by Electron-Beam-Induced Chemical Vapor Deposition

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